Applied optics Books

Book SynopsisThis new edition specifically addresses the most recent and relevant developments in the design and manufacture of OLED displays Provides knowledge of OLED fundamentals and related technologies for applications such as displays and solid state lighting along with processing and manufacturing technologies Serves as a reference for people engaged in OLED research, manufacturing, applications and marketing Includes coverage of white + color filter technology, which has become industry standard technology for large televisions Table of ContentsAbout the Author xi Preface xiii Series Editor’s Foreword to the Second Edition xv 1 Introduction 1 References 5 2 OLED Devices 7 2.1 OLED Definition 7 2.1.1 History of OLED Research and Development 7 2.1.2 Luminescent Effects in Nature 8 2.1.3 Difference Between OLED, LED, and Inorganic ELs 11 2.1.3.1 Inorganic EL 11 2.1.3.2 LED 11 2.2 Basic Device Structure 12 2.3 Basic Light Emission Mechanism 14 2.3.1 Potential Energy of Molecules 14 2.3.2 Highest Occupied and Lowest Unoccupied Molecular Orbitals (HOMO and LUMO) 15 2.3.3 Configuration of Two Electrons 17 2.3.4 Spin Function 20 2.3.5 Singlet and Triplet Excitons 20 2.3.6 Charge Injection from Electrodes 24 2.3.6.1 Charge Injection by Schottky Thermionic Emission 25 2.3.6.2 Tunneling Injection 28 2.3.6.3 Vacuum-Level Shift 28 2.3.7 Charge Transfer and Recombination 29 2.3.7.1 Charge Transfer Behavior 29 2.3.7.2 Space-Charge-Limited Current 29 2.3.7.3 Poole–Frenkel conduction 32 2.3.7.4 Recombination and Generation of Excitons 33 2.4 Emission Efficiency 36 2.4.1 Internal/External Quantum Efficiency 36 2.4.2 Energy Conversion and Quenching 37 2.4.2.1 Internal Conversion 37 2.4.2.2 Intersystem Crossing 37 2.4.2.3 Doping 38 2.4.2.4 Quenching 40 2.4.3 Outcoupling Efficiency of OLED Display 42 2.4.3.1 Light Output Distribution 42 2.4.3.2 Snell’s Law and Critical Angle 43 2.4.3.3 Loss Due to Light Extraction 44 2.4.3.4 Performance Enhancement by Molecular Alignment 45 2.5 Lifetime and Image Burning 46 2.5.1 Lifetime Definitions 46 2.5.2 Degradation Analysis and Design Optimization 47 2.5.3 Degradation Measurement and Mechanisms 50 2.5.3.1 Acceleration Factor and Temperature Contribution 50 2.5.3.2 Degradation Mechanism Variation 50 2.6 Technologies to Enhance the Device Performance 51 2.6.1 Thermally Activated Delayed Fluorescence 51 2.6.2 Other Types of Excited States 53 2.6.2.1 Excimer and Exciplex 53 2.6.2.2 Charge-Transfer Complex 53 2.6.3 Charge Generation Layer 54 References 56 3 OLED Manufacturing Process 61 3.1 Material Preparation 61 3.1.1 Basic Material Properties 61 3.1.1.1 Hole Injection Material 61 3.1.1.2 Hole Transportation Material 62 3.1.1.3 Emission Layer Material 62 3.1.1.4 Electron Transportation Material and Charge Blocking Material 63 3.1.2 Purification Process 67 3.2 Evaporation Process 68 3.2.1 Principle 68 3.2.2 Evaporation Sources 72 3.2.2.1 Resistive Heating Method 72 3.2.2.2 Electron Beam Evaporation 75 3.2.2.3 Monitoring Thickness Using a Quartz Oscillator 76 3.3 Encapsulation 79 3.3.1 Dark Spot and Edge Growth Defects 79 3.3.2 Light Emission from the Bottom and Top of the OLED Device 80 3.3.3 Bottom Emission and perimeter sealing 81 3.3.4 Top Emission 82 3.3.5 Encapsulation Technologies and Measurement 83 3.3.5.1 Thin-Film Encapsulation 84 3.3.5.2 Face Sealing Encapsulation 87 3.3.5.3 Frit Encapsulation 88 3.3.5.4 WVTR Measurement 88 3.4 Problem Analysis 91 3.4.1 Ionization Potential Measurement 91 3.4.2 Electron Affinity Measurement 92 3.4.3 HPLC Analysis 93 3.4.4 Cyclic Voltammetry 94 References 96 4 OLED Display Module 99 4.1 Comparison Between OLED and LCD Modules 99 4.2 Basic Display Design and Related Characteristics 101 4.2.1 Luminous Intensity, Luminance, and Illuminance 101 4.2.1.1 Luminous Intensity 101 4.2.1.2 Luminance 102 4.2.1.3 Illuminance 103 4.2.1.4 Metrics Summary 104 4.2.1.5 Helmholtz–Kohlrausch Effect 106 4.2.2 OLED Current Efficiencies and Power Efficacies 106 4.2.3 Color Reproduction 109 4.2.4 Uniform Color Space 115 4.2.5 White Point Determination 116 4.2.6 Color Boost 119 4.2.7 Viewing Condition 120 4.3 Passive-Matrix OLED Display 121 4.3.1 Structure 121 4.3.2 Pixel Driving 122 4.4 Active-Matrix OLED Display 125 4.4.1 OLED Module Components 125 4.4.2 Two-Transistor One-Capacitor (2T1C) Driving Circuit 127 4.4.3 Ambient Performance 136 4.4.3.1 Living Room Contrast Ratio 136 4.4.3.2 Chroma Reduction Due to Ambient Light 137 4.4.4 Subpixel Rendering 138 References 139 5 OLED Color Patterning Technologies 143 5.1 Color-Patterning Technologies 143 5.1.1 Shadow Mask Patterning 143 5.1.1.1 Shadow Mask Process 143 5.1.1.2 Blue Common Layer 146 5.1.1.3 Polychromatic Pixel 147 5.1.2 White+Color Filter Patterning 148 5.1.3 Color Conversion Medium (CCM) Patterning 149 5.1.4 Laser-Induced Thermal Imaging (LITI) Method 149 5.1.5 Radiation-Induced Sublimation Transfer (RIST) Method 151 5.1.6 Dual-Plate OLED Display (DOD) Method 152 5.1.7 Other Methods 153 5.2 Solution-Processed Materials and Technologies 153 5.3 Next-Generation OLED Manufacturing Tools 158 5.3.1 Vapor Injection Source Technology (VIST) Deposition 158 5.3.2 Hot-Wall Method 163 5.3.3 Organic Vapor-Phase Deposition (OVPD) Method 164 References 165 6 TFT and Driving for Active-Matrix Display 167 6.1 TFT Structure 167 6.2 TFT Process 169 6.2.1 Low-Temperature Polysilicon Process Overview 169 6.2.2 Thin-Film Formation 172 6.2.3 Patterning Technique 173 6.2.4 Excimer Laser Crystallization 177 6.3 MOSFET Basics 180 6.4 LTPS-TFT-Driven OLED Display Design 183 6.4.1 OFF Current 183 6.4.2 Driver TFT Size Restriction 184 6.4.3 Restriction Due to Voltage Drop 185 6.4.4 LTPS-TFT Pixel Compensation Circuit 190 6.4.4.1 Voltage Programming 190 6.4.4.2 Current Programming 192 6.4.4.3 External Compensation Method 193 6.4.4.4 Digital Driving 194 6.4.5 Circuit Integration by LTPS-TFT 197 6.5 TFT Technologies for OLED Displays 200 6.5.1 Selective Annealing Method 200 6.5.1.1 Sequential Lateral Solidification (SLS) Method 200 6.5.1.2 Selective Annealing by Microlens Array 200 6.5.2 Microcrystalline and Superamorphous Silicon 202 6.5.3 Solid-Phase Crystallization 205 6.5.3.1 MIC and MILC Methods 205 6.5.3.2 AMFC Method 205 6.5.4 Oxide Semiconductors 207 References 210 7 OLED Television Applications 215 7.1 Performance Target 215 7.2 Scalability Concept 217 7.2.1 Relationship between Defect Density and Production Yield 217 7.2.1.1 Purpose of Yield Simulation 217 7.2.1.2 Defective Pixel Number Estimation Using the Poisson Equation 217 7.2.2 Scalable Technology 217 7.2.2.1 Scalability 218 7.3 Murdoch’s Algorithm to Achieve Low Power and Wide Color Gamut 219 7.3.1 A Method for Achieving Both Low Power and Wide Color Gamut 219 7.3.2 RGBW Driving Algorithm 221 7.4 An Approach to Achieve 100% NTSC Color Gamut With Low Power Consumption Using White + Color Filter 224 7.4.1 Consideration of Performance Difference between W-RGB and W-RGBW Method 224 7.4.1.1 Issues of White+Color Filter Method for Large Displays 224 7.4.1.2 Analysis of W-RGBW Approach to Circumvent Its Trade-off Situation 224 7.4.1.3 Design of a Prototype to Demonstrate That Low Power Consumption Can Be Achieved with Large Color Gamut 229 7.4.1.4 Product-Level Performance Demonstration by the Combination of Scalable Technologies 230 References 233 8 New OLED Applications 235 8.1 Flexible Display/Wearable Displays 235 8.1.1 Flexible Display Applications 235 8.1.2 Flexible Display Substrates 235 8.1.3 Laser Liftoff Process 236 8.1.4 Barrier Technology for Flexible Displays 240 8.1.5 Organic TFTs for Flexible Displays 241 8.1.5.1 Organic Semiconductor Materials 242 8.1.5.2 Organic TFT Device Structure and Processing 243 8.1.5.3 Organic TFT Characteristics 245 8.2 Transparent Displays 245 8.3 Tiled Display 247 8.3.1 Passive-Matrix Tiling 247 8.3.2 Active-Matrix Tiling 248 References 252 9 OLED Lighting 255 9.1 Performance Improvement of OLED Lighting 255 9.2 Color Rendering Index 257 9.3 OLED Lighting Requirement 259 9.3.1 Correlated Color Temperature (CCT) 260 9.3.2 Other Requirements 262 9.4 Light Extraction Enhancement of OLED Lighting 262 9.4.1 Various Light Absorption Mechanisms 262 9.4.2 Microlens Array Structure 266 9.4.3 Diffusion Structure 266 9.4.4 Diffraction Structure 268 9.4.5 Reduction of Plasmon Absorption 268 9.4.5.1 Plasmonic Loss Mechanism 268 9.5 Color Tunable OLED Lighting 269 9.6 OLED Lighting Design 272 9.6.1 Resistance Reduction 272 9.6.2 Current Reduction 272 9.7 Roll-to-Roll OLED Lighting Manufacturing 273 References 275 Appendix 277 Index 281

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Book SynopsisCovers the fundamental science of grinding and polishing by examining the chemical and mechanical interactions over many scale lengths Manufacturing next generation optics has been, and will continue to be, enablers for enhancing the performance of advanced laser, imaging, and spectroscopy systems. This book reexamines the age-old field of optical fabrication from a materials-science perspective, specifically the multiple, complex interactions between the workpiece (optic), slurry, and lap. It also describes novel characterization and fabrication techniques to improve and better understand the optical fabrication process, ultimately leading to higher quality optics with higher yield. Materials Science and Technology of Optical Fabrication is divided into two major parts. The first part describes the phenomena and corresponding process parameters affecting both the grinding and polishing processes during optical fabrication. It then relates them to the critical resulting properties oTable of ContentsPreface xi Acknowledgments xvii Glossary of Symbols and Abbreviations xix Part I Fundamental Interactions – Materials Science 1 1 Introduction 3 1.1 Optical-Fabrication Processes 3 1.2 Major Characteristics of the Optical-Fabrication Process 7 1.3 Material Removal Mechanisms 11 References 12 2 Surface Figure 15 2.1 The Preston Equation 15 2.2 The Preston Coefficient 16 2.3 Friction at Interface 19 2.4 Kinematics and Relative Velocity 22 2.5 Pressure Distribution 25 2.5.1 Applied Pressure Distribution 26 2.5.2 Elastic Lap Response 27 2.5.3 Hydrodynamic Forces 28 2.5.4 Moment Forces 31 2.5.5 Viscoelastic and Viscoplastic Lap Properties 34 2.5.5.1 Viscoelastic Lap 34 2.5.5.2 Viscoplastic Lap 38 2.5.6 Workpiece–Lap Mismatch 38 2.5.6.1 Workpiece Shape 41 2.5.6.2 PadWear/Deformation 42 2.5.6.3 Workpiece Bending 44 2.5.6.4 Residual Grinding Stress 47 2.5.6.5 Temperature 51 2.5.6.6 Global Pad Properties 56 2.5.6.7 Slurry Spatial Distribution 58 2.5.6.8 Local Nonlinear Material Deposits 60 2.6 Deterministic Surface Figure 63 References 68 3 Surface Quality 75 3.1 Subsurface Mechanical Damage 75 3.1.1 Indentation Fracture Mechanics 76 3.1.1.1 Static Indentation 76 3.1.1.2 Edge Chipping and Bevels 81 3.1.1.3 Sliding Indentation 84 3.1.1.4 Impact Indentation Fracture 87 3.1.2 SSD During Grinding 92 3.1.2.1 Subsurface Mechanical Depth Distributions 92 3.1.2.2 Relationship of Roughness and Average Crack Length to the Maximum SSD Depth 97 3.1.2.3 Fraction of Abrasive Particles Mechanically Loaded 98 3.1.2.4 Relationship Between the Crack Length and Depth 100 3.1.2.5 SSD Depth-distribution Shape 102 3.1.2.6 Effect of Various Grinding Parameters on SSD Depth Distributions 104 3.1.2.7 Rogue Particles During Grinding 106 3.1.2.8 Conclusions on Grinding SSD 108 3.1.3 SSD During Polishing 109 3.1.4 Effect of Etching on SSD 118 3.1.4.1 Topographical Changes of SSD During Etching 120 3.1.4.2 Influence of SDD Distribution on Etch Rate and Roughness 123 3.1.5 Strategies to Minimize SSD 127 3.2 Debris Particles and Residue 129 3.2.1 Particles 130 3.2.2 Residue 132 3.2.3 Cleaning Strategies and Methods 134 3.3 The Beilby Layer 136 3.3.1 K Penetration by Two-step Diffusion 140 3.3.2 Ce Penetration by Chemical Reactivity 142 3.3.3 Chemical–Structural–Mechanical Model of the Beilby Layer and Polishing Process 145 References 148 4 Surface Roughness 157 4.1 Single-Particle Removal Function 157 4.2 Beilby Layer Properties 166 4.3 Slurry PSD 167 4.4 Pad Mechanical Properties and Topography 170 4.5 Slurry Interface Interactions 174 4.5.1 Slurry Islands and μ-roughness 174 4.5.2 Colloidal Stability of Particles in Slurry 180 4.5.3 Glass Reaction Product Buildup at Polishing Interface 184 4.5.4 Three-Body Forces at Polishing Interface 185 4.6 Slurry Redeposition 187 4.7 Predicting Roughness 192 4.7.1 EHMG – The Ensemble Hertzian Multi-gap Model 192 4.7.1.1 Pad Deflection and Fraction of Pad Area Making Contact 194 4.7.1.2 Asperity Stress, Interface Gap, Load/Particle Distribution, and Fraction of Active Particles 194 4.7.1.3 Single Particle Removal Function and Load per Particle Distribution 196 4.7.1.4 Monte Carlo Workpiece Roughness Simulation 196 4.7.2 IDG Island-distribution Gap Model 199 4.8 Strategies to Reduce Roughness 204 4.8.1 Strategy 1: Reduce or Narrow the Load-per-particle Distribution 204 4.8.2 Strategy 2: Modify the Removal Function of a Given Slurry 204 References 207 5 Material Removal Rate 211 5.1 Grinding Material Removal Rate 211 5.2 Polishing Material Removal Rate 217 5.2.1 Deviations from Macroscopic Preston Equation 217 5.2.2 Macroscopic Material Removal Trends from Microscopic/Molecular Phenomena 219 5.2.3 Factors Affecting Single-particle Removal Function 226 5.2.3.1 Nanoplastic Effects: Workpiece Hardness 226 5.2.3.2 Chemical Effects: Condensation Rate and Partial-charge Model 228 References 238 Part II Applications – Materials Technology 241 6 Increasing Yield: Scratch Forensics and Fractography 243 6.1 Fractography 101 243 6.2 Scratch Forensics 248 6.2.1 Scratch Width 249 6.2.2 Scratch Length 251 6.2.3 Scratch Type 251 6.2.4 Scratch Number Density 252 6.2.5 Scratch Orientation and Trailing-indent Curvature 252 6.2.6 Scratch Pattern and Curvature 252 6.2.7 Location on Workpiece 253 6.2.8 Scratch Forensics Example 254 6.3 Slow Crack Growth and Lifetime Predictions 254 6.4 Fracture Case Studies 257 6.4.1 Temperature-induced Fracture 257 6.4.1.1 Laser-Phosphate-glass Thermal Fracture 259 6.4.1.2 KDP Crystal-Workpiece Thermal Fracture 262 6.4.1.3 Thermal Fracture of Multilayers 265 6.4.2 Blunt Loading with Friction 267 6.4.3 Glass-to-metal Contact and Edge Chipping 269 6.4.4 Glue Chipping Fracture 271 6.4.5 Workpiece Failure from Differential Pressure 273 6.4.6 Chemical Interactions and Surface Cracking 276 6.4.6.1 Surface Cracking of Phosphate Glass 276 6.4.6.2 Surface Cracking of the DKDP Crystals 279 References 282 7 Novel Process and Characterization Techniques 285 7.1 Process Techniques 286 7.1.1 Stiff Versus Compliant Blocking 286 7.1.2 Strip Etch and Bulk Etch 290 7.1.3 Pad Wear Management with Septum or Conditioner 291 7.1.4 Hermetically Sealed, High-humidity Polishing Chamber 294 7.1.5 Engineered Filtration System 295 7.1.6 Slurry Chemical Stabilization 296 7.1.7 Slurry Lifetime and Slurry Recycling 300 7.1.8 Ultrasonic Pad Cleaning 301 7.2 Workpiece Characterization Techniques 304 7.2.1 Single-particle Removal Function Using Nanoscratching 304 7.2.2 Subsurface Damage Measurement Using a Taper Wedge 305 7.2.3 Stress Measurement Using the Twyman Effect 306 7.2.4 Beilby Layer Characterization Using SIMS 307 7.2.5 Surface Densification Using Indentation and Annealing 308 7.2.6 Crack Initiation and Growth Constants Using Static Indentation 309 7.3 Polishing- or Grinding-system Characterization Techniques 309 7.3.1 Tail End of Slurry PSD Using SPOS 309 7.3.2 Pad Topography Using Confocal Microscopy 311 7.3.3 Slurry Stability Using Zeta Potential 311 7.3.4 Temperature Distribution During Polishing Using IR Imaging 313 7.3.5 Slurry Spatial Distribution and Viscoelastic Lap Response Using a Nonrotating Workpiece 314 7.3.6 Slurry Reactivity Versus Distance Using Different Pad Grooves 315 References 316 8 Novel Polishing Methods 319 8.1 Magnetorheological Finishing (MRF) 319 8.2 Float Polishing 326 8.3 Ion Beam Figuring (IBF) 329 8.4 Convergent Polishing 331 8.5 Tumble Finishing 336 8.6 Other Subaperture Polishing Methods 344 References 347 9 Laser Damage Resistant Optics 353 9.1 Laser Damage Precursors 356 9.2 Reduction of SSD in Laser Optics 362 9.3 Advanced Mitigation Process 363 References 369 Index 371

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Book SynopsisA groundbreaking guide dedicated exclusively to the MCRT method in radiation heat transfer and applied optics The Monte Carlo Ray-Trace Method in Radiation Heat Transfer and Applied Optics offers the most modern and up-to-date approach to radiation heat transfer modelling and performance evaluation of optical instruments. The Monte Carlo ray-trace (MCRT) method is based on the statistically predictable behavior of entities, called rays, which describe the paths followed by energy bundles as they are emitted, reflected, scattered, refracted, diffracted and ultimately absorbed. The author a noted expert on the subject covers a wide variety of topics including the mathematics and statistics of ray tracing, the physics of thermal radiation, basic principles of geometrical and physical optics, radiant heat exchange among surfaces and within participating media, and the statistical evaluation of uncertainty of results obtained using the method. The booTable of ContentsSeries Preface xi Preface xiii Acknowledgments xvii About the Companion Website xix 1 Fundamentals of Ray Tracing 1 1.1 Rays and Ray Segments 1 1.2 The Enclosure 2 1.3 Mathematical Preliminaries 2 1.4 Ideal Models for Emission, Reflection, and Absorption of Rays 11 1.5 Scattering and Refraction 17 1.6 Meshing and Indexing 18 Problems 21 Reference 28 2 Fundamentals of Thermal Radiation 29 2.1 Thermal Radiation 29 2.2 Terminology 31 2.3 Intensity of Radiation (Radiance) 32 2.4 Directional Spectral Emissive Power 34 2.5 Hemispherical Spectral Emissive Power 34 2.6 Hemispherical Total Emissive Power 34 2.7 The Blackbody Radiation Distribution Function 35 2.8 Blackbody Properties 38 2.9 Emission and Absorption Mechanisms 40 2.10 Definition of Models for Emission, Absorption, and Reflection 42 2.11 Introduction to the Radiation Behavior of Surfaces 52 2.12 Radiation Behavior of Surfaces Composed of Electrical Non-Conductors (Dielectrics) 54 2.13 Radiation Behavior of Surfaces Composed of Electrical Conductors (Metals) 59 Problems 61 References 65 3 The Radiation Distribution Factor for Diffuse-Specular Gray Surfaces 67 3.1 The Monte Carlo Ray-Trace (MCRT) Method and the Radiation Distribution Factor 67 3.2 Properties of the Total Radiation Distribution Factor 68 3.3 Estimation of the Distribution Factor Matrix Using the MCRT Method 69 3.4 Binning of Rays on a Surface Element; Illustrative Example 83 3.5 Case Study: Thermal and Optical Analysis of a Radiometric Instrument 85 3.6 Use of Radiation Distribution Factors for the Case of Specified Surface Temperatures 94 3.7 Use of Radiation Distribution Factors When Some Surface Net Heat Fluxes Are Specified 96 Problems 97 Reference 101 4 Extension of the MCRT Method to Non-Diffuse, Non-Gray Enclosures 103 4.1 Bidirectional Spectral Surfaces 103 4.2 Principles Underlying a Practical Bidirectional Reflection Model 106 4.3 First Example: A Highly Absorptive Surface Whose Reflectivity is Strongly Specular 109 4.4 Second Example: A Highly Reflective Surface Whose Reflectivity is Strongly Diffuse 119 4.5 The Band-Averaged Spectral Radiation Distribution Factor 127 4.6 Use of the Band-Averaged Spectral Radiation Distribution Factor for the Case of Specified Surface Temperatures 133 4.7 Use of the Band-Averaged Spectral Radiation Distribution Factor for the Case of One or More Specified Surface Net Heat Fluxes 134 Problems 138 References 142 5 The MCRT Method for Participating Media 143 5.1 Radiation in a Participating Medium 143 5.2 Example: The Absorption Filter 146 5.3 Ray Tracing in a Participating Medium 154 5.4 Estimating the Radiation Distribution Factors in Participating Media 171 5.5 Using the Radiation Distribution Factors When All Temperatures are Specified 172 5.6 Using the Radiation Distribution Factors for a Mixture of Specified Temperatures and Specified Heat Transfer Rates 173 5.7 Simulating Infrared Images 175 Problems 178 References 179 6 Extension of the MCRT Method to Physical Optics 183 6.1 Some Ideas from Physical Optics 183 6.2 Geometrical Versus Physical Optics 185 6.3 Anatomy of a Ray Suitable for Physical Optics Applications 186 6.4 Modeling of Polarization Effects: A Case Study 187 6.5 Diffraction and Interference Effects: A Case Study 195 6.6 Monte Carlo Ray-Trace Diffraction Based on the Huygens–Fresnel Principle 198 Problems 209 References 210 7 Statistical Estimation of Uncertainty in the MCRT Method 213 7.1 Statement of the Problem 213 7.2 Statistical Inference 214 7.3 Hypothesis Testing for Population Means 218 7.4 Confidence Intervals for Population Proportions 220 7.5 Effects of Uncertainties in the Enclosure Geometry and Surface Models 224 7.6 Single-Sample versus Multiple-Sample Experiments 225 7.7 Evaluation of Aggravated Uncertainty 226 7.8 Uncertainty in Temperature and Heat Transfer Results 227 7.9 Application to the Case of Specified Surface Temperatures 229 7.10 Experimental Design of MCRT Algorithms 232 Problems 237 References 239 A Random Number Generators and Autoregression Analysis 241 A.1 Pseudo-Random Number Generators 242 A.2 Properties of a “Good” Pseudo-Random Number Generator 242 A.3 A “Minimal Standard” Pseudo-Random Number Generator 245 A.4 Autoregression Analysis 247 Problems 253 References 254 Index 255

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Book SynopsisBuilding upon the success of previous editions, this volume continues to serve the needs of professionals who need to understand visual perception as well as produce, reproduce, and measure color appearance in such applications as imaging, entertainment, materials, design, architecture, and lighting.Table of ContentsSeries Preface xiii Preface xv Acknowledgments xviii Introduction xix 1 Human Color Vision 1 1.1 Optics of the Eye 2 1.2 The Retina 7 1.3 Visual Signal Processing 14 1.4 Mechanisms of Color Vision 19 1.5 Spatial and Temporal Properties of Color Vision 27 1.6 Color Vision Deficiencies 32 1.7 Key Features for Color Appearance Modeling 36 2 Psychophysics 38 2.1 Psychophysics Defined 39 2.2 Historical Context 40 2.3 Hierarchy of Scales 43 2.4 Threshold Techniques 45 2.5 Matching Techniques 49 2.6 One-Dimensional Scaling 50 2.7 Multidimensional Scaling 52 2.8 Design of Psychophysical Experiments 54 2.9 Importance in Color Appearance Modeling 55 3 Colorimetry 56 3.1 Basic and Advanced Colorimetry 57 3.2 Why is Color? 57 3.3 Light Sources and Illuminants 59 3.4 Colored Materials 63 3.5 The Human Visual Response 68 3.6 Tristimulus Values and Color Matching Functions 70 3.7 Chromaticity Diagrams 77 3.8 Cie Color Spaces 79 3.9 Color Difference Specification 81 3.10 The Next Step 83 4 Color Appearance Terminology 85 4.1 Importance of Definitions 85 4.2 Color 86 4.3 Hue 88 4.4 Brightness and Lightness 88 4.5 Colorfulness and Chroma 90 4.6 Saturation 91 4.7 Unrelated and Related Colors 91 4.8 Definitions in Equations 92 4.9 Brightness–Colorfulness Vs Lightness–Chroma 94 5 Color Order Systems 97 5.1 Overview and Requirements 98 5.2 The Munsell Book of Color 99 5.3 The Swedish Ncs 104 5.4 The Colorcurve System 106 5.5 Other Color Order Systems 107 5.6 Uses of Color Order Systems 109 5.7 Color Naming Systems 112 6 Color Appearance Phenomena 115 6.1 What are Color Appearance Phenomena? 115 6.2 Simultaneous Contrast, Crispening, and Spreading 116 6.3 Bezold–Brücke Hue Shift (Hue Changes with Luminance) 120 6.4 Abney Effect (Hue Changes with Colorimetric Purity) 121 6.5 Helmholtz–Kohlrausch Effect (Brightness Depends On Luminance and Chromaticity) 123 6.6 Hunt Effect (Colorfulness Increases with Luminance) 125 6.7 Stevens Effect (Contrast Increases with Luminance) 127 6.8 Helson–Judd Effect (Hue of Non-Selective Samples) 129 6.9 Bartleson–Breneman Equations (Image Contrast Changes with Surround) 131 6.10 Discounting-the-Illuminant 132 6.11 Other Context, Structural, and Psychological Effects 133 6.12 Color Constancy? 140 7 Viewing Conditions 142 7.1 Configuration of the Viewing Field 142 7.2 Colorimetric Specification of the Viewing Field 146 7.3 Modes of Viewing 149 7.4 Unrelated and Related Colors Revisited 154 8 Chromatic Adaptation 156 8.1 Light, Dark, and Chromatic Adaptation 157 8.2 Physiology 159 8.3 Sensory and Cognitive Mechanisms 170 8.4 Corresponding Colors Data 174 8.5 Models 177 8.6 Color Inconstancy Index 178 8.7 Computational Color Constancy 179 9 Chromatic Adaptation Models 181 9.1 Von Kries Model 182 9.2 Retinex Theory 186 9.3 Nayatani et al. Model 187 9.4 Guth’s Model 190 9.5 Fairchild’s 1990 Model 192 9.6 Herding Cats 196 9.7 Cat02 197 10 Color Appearance Models 199 10.1 Definition of Color Appearance Models 199 10.2 Construction of Color Appearance Models 200 10.3 Cielab 201 10.4 Why Not Use Just Cielab? 210 10.5 What About Cieluv? 210 11 The Nayatani et al. Model 213 11.1 Objectives and Approach 213 11.2 Input Data 214 11.3 Adaptation Model 215 11.4 Opponent Color Dimensions 217 11.5 Brightness 218 11.6 Lightness 219 11.7 Hue 219 11.8 Saturation 220 11.9 Chroma 221 11.10 Colorfulness 221 11.11 Inverse Model 222 11.12 Phenomena Predicted 222 11.13 Why Not Use Just the Nayatani et al. Model? 223 12 The Hunt Model 225 12.1 Objectives and Approach 225 12.2 Input Data 226 12.3 Adaptation Model 228 12.4 Opponent Color Dimensions 233 12.5 Hue 234 12.6 Saturation 235 12.7 Brightness 236 12.8 Lightness 238 12.9 Chroma 238 12.10 Colorfulness 238 12.11 Inverse Model 239 12.12 Phenomena Predicted 241 12.13 Why Not Use Just the Hunt Model? 242 13 The Rlab Model 243 13.1 Objectives and Approach 243 13.2 Input Data 245 13.3 Adaptation Model 246 13.4 Opponent Color Dimensions 248 13.5 Lightness 250 13.6 Hue 250 13.7 Chroma 252 13.8 Saturation 252 13.9 Inverse Model 252 13.10 Phenomena Predicted 254 13.11 Why Not Use Just the Rlab Model? 254 14 Other Models 256 14.1 Overview 256 14.2 Atd Model 257 14.3 Llab Model 264 14.4 Ipt Color Space 271 15 The Cie Color Appearance Model (1997), Ciecam97s 273 15.1 Historical Development, Objectives, and Approach 273 15.2 Input Data 276 15.3 Adaptation Model 277 15.4 Appearance Correlates 279 15.5 Inverse Model 280 15.6 Phenomena Predicted 281 15.7 The Zlab Color Appearance Model 282 15.8 Why Not Use Just Ciecam97s? 285 16 Ciecam02 287 16.1 Objectives and Approach 287 16.2 Input Data 288 16.3 Adaptation Model 290 16.4 Opponent Color Dimensions 294 16.5 Hue 294 16.6 Lightness 295 16.7 Brightness 295 16.8 Chroma 295 16.9 Colorfulness 296 contents xi 16.10 Saturation 296 16.11 Cartesian Coordinates 296 16.12 Inverse Model 297 16.13 Implementation Guidelines 297 16.14 Phenomena Predicted 298 16.15 Computational Issues 298 16.16 Cam02-Ucs 300 16.17 Why Not Use Just Ciecam02? 301 16.18 Outlook 301 17 Testing Color Appearance Models 303 17.1 Overview 303 17.2 Qualitative Tests 304 17.3 Corresponding-Colors Data 308 17.4 Magnitude Estimation Experiments 310 17.5 Direct Model Tests 312 17.6 Colorfulness in Projected Images 316 17.7 Munsell in Color Appearance Spaces 317 17.8 Cie Activities 318 17.9 A Pictorial Review of Color Appearance Models 323 18 Traditional Colorimetric Applications 328 18.1 Color Rendering 328 18.2 Color Differences 333 18.3 Indices of Metamerism 335 18.4 A General System of Colorimetry? 337 18.5 What About Observer Metamerism? 338 19 Device-Independent Color Imaging 341 19.1 The Problem 342 19.2 Levels of Color Reproduction 343 19.3 A Revised Set of Objectives 345 19.4 General Solution 348 19.5 Device Calibration and Characterization 349 19.6 The Need for Color Appearance Models 354 19.7 Definition of Viewing Conditions 355 19.8 Viewing-Conditions-Independent Color Space 357 19.9 Gamut Mapping 357 19.10 Color Preferences 361 19.11 Inverse Process 362 19.12 Example System 363 19.13 Icc Implementation 364 20 I mage Appearance Modeling and the Future 369 20.1 From Color Appearance to Image Appearance 370 20.2 S-Cielab 375 20.3 The icam Framework 376 20.4 A Modular Image Difference Model 382 20.5 Image Appearance and Rendering Applications 385 20.6 Image Difference and Quality Applications 391 20.7 icam06 392 20.8 Orthogonal Color Space 393 20.9 Future Directions 396 21 High-Dynamic-Range Color Space 399 21.1 Luminance Dynamic Range 400 21.2 The Hdr Photographic Survey 401 21.3 Lightness–Brightness Beyond Diffuse White 403 21.4 hdr-Cielab 404 21.5 hdr-Ipt 406 21.6 Evans, G0, and Brilliance 407 21.7 The Nayatani Theoretical Color Space 409 21.8 A New Kind of Appearance Space 409 21.9 Future Directions 416 References 418 Index 440

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Book SynopsisFor a host of reasons, nonlinear optical spectroscopy is a valuable tool for biochemical applications where minimally invasive diagnostics is desired. Biochemical Applications of Nonlinear Optical Spectroscopy presents the latest technological advances and offers a perspective on future directions in this important field.Written by an international panel of experts, this volume begins with a comparison of nonlinear optical spectroscopy and x-ray crystallography. The text examines the use of multiphoton fluorescence to study chemical phenomena in the skin, the use of nonlinear optics to enhance traditional optical spectroscopy, and the multimodal approach, which incorporates several spectroscopic techniques in one instrument. Later chapters explore Raman microscopy, third-harmonic generation microscopy, and non-linear Raman microspectroscopy. The text explores the promise of beam shaping and the use of broadband laser pulse generated through continuum gTrade Review"Overall, the book is well written and contains lots of valuable information suitable for a range of audiences! contains a wealth of information and, in my view, represents a worthy purchase. It will make good reading for many agronomy, plant nutrition and agricultural extension professionals." -Experimental AgricultureTable of ContentsStructural Dynamics and Kinetics of Myoglobin-CO Binding: Lessons from Time-Resolved X-ray Diffraction and Four-Wave Mixing Spectroscopy. Using Two-Photon Fluorescence Microscopy to Study Chemical Phenomena in the Skin. Ultrafast Fluorescence Microscopes. Multicontrast Nonlinear Imaging Microscopy. Broadband Laser Source and Sensitive Detection Solutions for Coherent Anti-Stokes Raman Scattering Microscopy. Nonlinear Optical Microspectroscopy of Biochemical Interactions in Microfluidic Devices. Advanced Multiphoton and CARS* Microspectroscopy with Broadband Shaped Femtosecond Laser Pulses. Nonlinear Optical Imaging with Sub-10 fs Pulses. Imaging with Phase Sensitive Narrowband Nonlinear Microscopy. Biomolecular Imaging by Near-Field Nonlinear Spectroscopy and Microscopy.

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Book SynopsisDiffractive Nanophotonics demonstrates the utility of the well-established methods of diffractive computer optics in solving nanophotonics tasks. It is concerned with peculiar properties of laser light diffraction by microoptics elements with nanoscale features and light confinement in subwavelength space regions. Written by recognized experts in this field, the book covers in detail a wide variety of advanced methods for the rigorous simulation of light diffraction. The authors apply their expertise to addressing cutting-edge problems in nanophotonics.Chapters consider the basic equations of diffractive nanophotonics and related transformations and numerical methods for solving diffraction problems under strict electromagnetic theory. They examine the diffraction of light on two-dimensional microscopic objects of arbitrary shape and present a numerical method for solving the problem of diffraction on periodic diffractive micro- and nanostructures. This methTrade Review"The authors have offered a comprehensive and accessible reference for computational methods in difractive nanophotonics."—Axel Mainzer in Optics & Photonics NewsTable of ContentsBasic equations of diffractive nanophotonics. Numerical methods for diffraction theory. Diffraction on cylindrical inhomogeneities comparable to the wavelength. Modelling of periodic diffractive micro- and nanostructures. Photonic crystals and light focusing. Photonic crystal fibres. Singular optics and superresolution. Optical trapping and manipulation of micro- and nano-objects. Conclusion. Appendices. Index.

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Book SynopsisIn this new edition of an SPIE bestseller, R. C. Olsen examines the definition and uses of remote sensing from a military perspective. The book discusses the instruments and principles that support a wide range of systems, including optical, thermal, radar, and LiDAR. Full-color images, as well as detailed examples and problems sets, make this a valuable textbook for students and engineers alike.

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Book SynopsisSince the publication of the first edition of the Handbook in 2002, optical methods for biomedical diagnostics have developed in many well-established directions, and new trends have also appeared. To encompass all current methods, the text has been updated and expanded into two volumes.Volume 1: Light - Tissue Interaction features eleven chapters, five of which focus on the fundamental physics of light propagation in turbid media such as biological tissues. The six following chapters introduce near-infrared techniques for the optical study of tissues and provide a snapshot of current applications and developments in this dynamic and exciting field. Topics include the scattering of light in disperse systems, the optics of blood, tissue phantoms, a comparison between time-resolved and continuous-wave methods, and optoacoustics.Volume 2: Methods begins by describing the basic principles and diagnostic applications of optical techniques based on detecting and processing the scattering, fluorescence, FT IR, and Raman spectroscopic signals from various tissues, with an emphasis on blood, epithelial tissues, and human skin. The second half of the volume discusses specific imaging technologies, such as Doppler, laser speckle, optical coherence tomography (OCT), and fluorescence and photoacoustic imaging.

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Book SynopsisThis is an engineering treatise for mechanical engineers who design and analyze optical systems. It will also be of interest to other professionals working in the optics industry. The treatise is based on both the physical science and the practical realities of designing, analyzing, building, testing, and servicing real optical products.Trade Review“An important contribution to the field, this book provides engineers valuable insight into the governing parameters of optomechanical design that develop an engineer’s intuition and lead to superior design solutions.” - Dr. Keith Doyle, MIT Lincoln Lab; Author, Integrated Optomechanical Analysis

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Book SynopsisOptics Using MATLAB® provides a functional overview of the development of MATLAB code that can be used to enhance and increase one’s understanding of optics though the use of visualization tools. The book ties a variety of optical topics to MATLAB programming activities and can act as a supplement to other textbooks or can stand alone. Part I focuses on a wide range of basic programming fundamentals using MATLAB and includes such topics as curve fitting, image processing, and file storage. Part II provides a review of selected topics in optics and demonstrates how these can be explored using MATLAB scripts. Part III discusses how to use MATLAB to improve the usability of custom programs through graphical user interfaces and incorporation of other programming languages. Those who need flexibility and special calculations in their optical design or optical engineering work will find value in the book’s explanations and examples of user-programmable software.Table of Contents Preface Acronyms and Abbreviations I MATLAB® Overview 1 Introduction to MATLAB 1.1 Getting Started with MATLAB 1.2 Anatomy of a Program 1.3 MATLAB Basic Functions and Operators 1.4 Simple Calculations using MATLAB 1.5 Vectorization and Matrix Indexing 1.6 MATLAB Scripts 1.7 MATLAB Functions 1.8 Practice Problems References 2 Plotting Mathematical Functions 2.1 Mathematical Functions 2.2 Visualization Functions: plot() 2.3 Visualization Functions: histogram() 2.4 Visualization Functions: 3D plotting 2.5 Visualization Functions: contour() and quiver() 2.6 Visualization Functions: images 2.7 Practice Problems References 3 Linear Amplifiers 3.1 Polynomial Synthesis and Curve Fitting 3.2 Polynomial Curve Fitting 3.3 Signal-to-Noise Ratio 3.4 Best Fit through the Data 3.5 Best Fit to the Data 3.6 Practice Problems References 4 Data and Data Files 4.1 Text versus Binary 4.2 Writing Data Files 4.3 Generating Data to be Saved 4.4 Reading and Using Data Files 4.5 Binary MAT Files 4.6 Binary Image Files 4.7 Practice Problem References 5 Images and Image Processing 5.1 Image Files 5.2 Image Commands 5.3 Image Size and Superpixels 5.4 Color Models and Conversions 5.5 Spatial Filtering 5.6 Practice Problems References II OPTICS APPLICATIONS 6 Ray Optics and Glass Equations 6.1 Lensmaker's Equation and Spot Size 6.2 Paraxial Region and Snell's Law 6.3 Matrix Approach to Ray Tracing 6.4 Ray Tracing through Multiple Elements 6.5 Glass Equations 6.6 Practice Problems References 7 Spectrometers 7.1 Dispersion in a Material 7.2 Prisms 7.3 Gratings 7.4 Blazed Gratings 7.5 Grisms 7.6 Spectrometers and Monochrometers 7.7 Practice Problems References 8 Modulation Transfer Function and Contrast 8.1 Image Quality 8.2 Spatial Frequency and Modulation Transfer Function 8.3 Point Spread Function 8.4 MTF Measurement 8.5 Effect of Annular Optics on MTF 8.6 Image Transformation 8.7 Practice Problems References 9 Diffraction and Interference 9.1 Interference 9.2 Coherence 9.3 Diffraction 9.4 Young's Double-Slit Experiment 9.5 Michelson Stellar Interferometer 9.6 Mach–Zhender Interferometer 9.7 Practice Problems References 10 Zernike Polynomials and Wavefronts 10.1 Wavefront Sensing in Adaptive Optics 10.2 Wavefront Aberrations 10.3 Zernike Polynomials 10.4 Wavefront Construction 10.5 Practice Problems References Further Reading 11 Polarizations 11.1 Polarized Light 11.2 Double Refraction 11.3 The Jones Calculus: Polarizers 11.4 The Jones Calculus: Phase Retarders 11.5 The Mueller Calculus 11.6 Jones-to-Mueller Transformation 11.7 Practice Problems References 12 Optical Interference Filters 12.1 Transfer Matrix for Thin Films 12.2 Antireflection Systems 12.3 High-Reflectance Systems 12.4 Bandpass Filters 12.5 Composite Filters 12.6 Index of Refraction Calculation 12.7 Practice Problems References 13 Metals and Complex Index of Refraction 13.1 Physical Vapor Deposition 13.2 Index of Refraction in Absorbing Media 13.3 Reflectivity of Metal Films 13.4 Absorption and Transmission in Metal Films 13.5 Impedance Matching 13.6 Practice Problems References III More with MATLAB 14 User Interfaces 14.1 Simple User Interfaces 14.2 Built-In Interfaces 14.3 Graphical User Interfaces: GUIDE 14.4 Applications: App Designer 14.5 Zernike GUI Project 14.6 Practice Problems References 15 Completing and Packaging Programs 15.1 P-Code 15.2 Publishing 15.3 Version Control 15.4 Interfacing with other Programming Languages 15.5 Object-Oriented Programming and More References Bibliography Index

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Book SynopsisExtreme ultraviolet lithography (EUVL) is the principal lithography technology—beyond the current 193-nm-based optical lithography—aiming to manufacture computer chips, and recent progress has been made on several fronts: EUV light sources, scanners, optics, contamination control, masks and mask handling, and resists. This book covers the fundamental and latest status of all aspects of EUVL used in the field.Since 2008, when SPIE Press published the first edition of EUVL Lithography, much progress has taken place in the development of EUVL as the choice technology for next-generation lithography. In 2008, EUVL was a prime contender to replace 193-nm-based optical lithography in leading-edge computer chip making, but not everyone was convinced at that point. Switching from 193-nm to 13.5-nm wavelengths was a much bigger jump than the industry had attempted before. It brought several difficult challenges in all areas of lithography—light source, scanner, mask, mask handling, optics, optics metrology, resist, computation, materials, and optics contamination. These challenges have been effectively resolved, and several leading-edge chipmakers have announced dates, starting in 2018, for inserting EUVL into high-volume manufacturing.This comprehensive volume comprises contributions from the world’s leading EUVL researchers and provides the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. This book is intended for people involved in one or more aspects of EUVL, as well as for students, who will find this text equally valuable.

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Book SynopsisThis first volume of the series Lectures in Optics introduces the simplest optical phenomena and the simplest optical instruments. Among these phenomena, rectilinear propagation, reflection, and refraction dominate the optical effects in nature and are essential to understanding the function of simple optical devices. Introduction to Optics presents the arguments relating to the nature of light and its propagation, the basic interactions between light and matter, and the energy aspect of light in relation to the quantitative measurement of visible radiation (photometry). It covers the fundamental laws governing reflection and refraction, as well as their applications in prisms and atmospheric phenomena. Simple optical instruments such as the pinhole camera, the human eye, the microscope, the telescope, and the photographic camera are covered. The text is accompanied by copious diagrams and striking photographs whose visual appeal entices readers to delve into the concepts. This book is suitable for various levels of instruction, from high school upper-level STEM classes to entry-level college optics 101 courses. Practice examples throughout the chapters reinforce an understanding of the presented material.Table of Contents The Nature of Light Photometry Reflection & Refraction Simple Optical Instruments Microscopes and Telescopes The Photographic Camera

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Book SynopsisThis second volume of the series Lectures in Optics develops a thorough presentation of geometrical optics effects. The book begins by discussing refraction and reflection off single surfaces, both flat and spherical. Presented next are the essential building elements, optical power and beam vergence, which are paramount in imaging because the incident vergence is added to the element’s power to produce the vergence leaving the optical element. Imaging definitions and formulation are covered next, followed by the power configurations and imaging arrangements possible with a single element, a single lens, and a mirror for real and virtual objects. Next, two more parameters are introduced: the extent of an element along the optical axis (thick lenses and lens systems) and the extent of an element perpendicular to the optical axis (stops and pupils). The way image quality is affected by the transverse restriction of light is then discussed, including resolution and image blur. Finally, the book introduces the concepts of optical aberrations as a consequence of a violation of the paraxial approximations. This book is suitable for all Geometrical Optics courses at college, graduate school, or professional school levels, such as physics, engineering, visual science, or optometry programs. Comprehensive practice examples, exercises, and quizzes throughout the chapters reinforce an understanding of the covered material.Table of Contents Refraction at a Spherical Interface Lens Refraction and Power Imaging Definitions Imaging with Lenses Imaging with Mirrors Thick Lenses and Lens Systems Finite Transverse Optics Optical Aberrations

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Book SynopsisThis book demonstrates how to design an optical system using Synopsis CODE VR, a full-featured optical design program that has a command line interface. The complete design process (from lens definition to the description and evaluation of lens errors on to the improvement of lens performance) will be developed and illustrated using the program. This text is not a user’s manual for CODE V. Rather, it starts with a single lens to demonstrate the laws of optics and illustrates the basic optical errors (aberrations). Then, through a series of examples, demonstrations, and exercises, readers can follow each step in the design process using the CODE V commands to analyze and optimize the system for the lens to perform according to specifications. The text is organized to help readers (1) reproduce each step of the process including the plots for evaluating lens performance and (2) understand its significance in producing a final design.

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Book SynopsisThis book mainly concerns the experimental aspects of a rapidly developing area of modern photonics, i.e., the singular optics of partially coherent, partially polarized, and polychromatic light fields. This topic gives rise to both new concepts and experimental tools for laboratory investigation, and considerable extension of the possibilities for implementation of the singular optics paradigm in solving diverse practical problems ranging from nanoscience to astrophysics.

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Book SynopsisPractical Optical Dimensional Metrology provides basic explanations of the operation and application of the most common methods in the field and in commercial use. The first half of the book presents a working knowledge of the mechanism and limitations of optical dimensional measurement methods that use: light level changes, two-dimensional imaging, triangulation, structured-light patterns, interference patterns, optical focus, light characteristics such as polarization, and hybrid methods with mechanical or other measurement tools. The book concludes with a series of manufacturing application examples that look at measurements from the centimeter range down to the nanometer range.

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Book SynopsisOptical Interference Filters Using MATLAB® provides a foundation for the development of MATLAB code for simulating the performance of thin-film optical structures that can be combined to make interference filters. MATLAB has excellent calculation and visualization capabilities that together are well aligned to the matrix methods commonly used for thin-film calculations. The simulations developed in this book begin with filters based on simple dielectric materials both with and without dispersion. Building on the discussion of these simple filters, simulations are next developed for metal-layer-based induced-transmission filters, and finally for complete thin-film interference filters. Readers ranging from students to practicing scientists and engineers will find that these simulations work well in conjunction with other textbooks in the field, or they can stand alone. The ability to generate custom programs and tune them to explore specific features of optical interference filters is anticipated to enhance the designer’s understanding and appreciation of the subtleties involved in filter design.Table of Contents Light: Reflection and Transmission Complex Index of Refraction in Optical Materials Optical Admittance Matching Dielectric Thin-Film Structures Maximum Potential Transmittance for Induced-Transmission Filters Offband Effects in Induced-Transmission Filters Enhancing Bandpass Filters Interference Filter Applications From Simulators to Functional Filters

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Book SynopsisSurvey investigations, with the end goal of monitoring the entire celestial sphere, have become a priority in astronomy. This book is the first monograph devoted to wide-field telescopes, intended to bridge the gap between astronomers and professional opticians. It emphasizes the deep connection between classical and new telescopes, as well as the continuity of ideas underlying the development of telescope construction. The contents are presented in the simplest form to promote a clear understanding of new designs; descriptions of optical systems are accompanied by extensive graphic information provided by Zemax. Both exact modern optimization and the theory of aberrations are used in explanations, with the former given priority.

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Book SynopsisThis book is published in cooperation with the OSA Foundation and CSIC.Light is an element that draws together many areas of human knowledge: physics, chemistry, biology, astronomy, engineering, and art. Moreover, optical phenomena and the technologies based on them are widespread in our daily lives. However, it can be difficult to understand or explain these phenomena. What is light? Where are optics and photonics present in our lives and in nature? What lies behind different optical phenomena? What is an optical instrument? How does the eye resemble an optical instrument? How can we explain human vision?This book, written by a group of young scientists, answers these questions and many more to help you to get to know the exciting world of optics and photonics. It is intended for the general public, with an emphasis on students at all levels of secondary education. A variety of easy-to-follow experiments related to different optical phenomena and technologies are presented. All of them are preceded by an explanation of the concepts and accompanied by numerous illustrations and curiosities. All of it is meant for you to have fun with optics and photonics!Table of Contents What is light? Lights sources and detectors Optical instruments The human eye: a biological camera Light in nature Light-based technologies

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Book SynopsisThis book traces the historical development of microscopy instruments from their invention to the current state of the art. New concepts and engineering solutions are presented for modern light microscopes, with a focus on the practical construction of optical systems. Real design parameters of dioptric objectives and other systems are provided to supply readers with basic information for independent designs. Full-color photomicrographs of real objects illustrate the quality of aberration correction that is required from optics.Table of Contents Non-modern Modern Microscopes Abstracts and Reviews Principles of Constructing Microscope Optics

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Book SynopsisThis book provides mathematical analyses of scanning devices in optical and laser systems to yield results with higher accuracy than those obtained by geometrical imaging an object with a movable mirror or prism. Topics include the laws of reflection and refraction and the mathematical preliminaries of analytical raytracing; mirror-scanning devices with one axis of rotation (conic-section scanning) and with two axes of rotation (gimbaled mirror and galvanometric scanners in cascade for 2D scanning); and Risley-prism-based beam-steering systems. Readers should have a foundation in vector operation and calculus, and a reasonable knowledge of elementary optics and lasers.Table of Contents Introduction One-Mirror and One-Axis Scanning Devices Scan Field of Rotating Reflective Polygons Differential Geometry of the Ruled Surfaces Optically Produced by Mirror Scanning Devices Two-Mirror and Two-Axis Scanning Systems of Different Configurations Gimbaled Mirror for Two-Dimensional Beam-Steering Exact and Approximate Solutions for Risley-Prism-Based Beam-Steering Systems in Different Configurations Forward and Inverse Solutions for Two-Element Risley-Prism-Based Beam-Steering Systems in Different Configurations Inverse Solutions for Three-Element Risley-Prism-Based Beam-Steering Systems in Different Configurations Error Sources and Their Influence on the Performance of Risley-Prism-Based Beam Steering Systems

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Book SynopsisThis second edition is completely revised and improved and contains eight new chapters and six new appendixes. In addition to the theoretical background on light propagation through diffusive media, this update also provides new didactical material, including: A comprehensive statistical approach to the photon penetration depth in diffusive media. An introduction to anomalous transport. An anisotropic transport approach within the framework of diffusion theory. An introduction to the invariance properties of radiative transfer in non-absorbing media. A heuristic explanation of ballistic photon propagation. An expanded description of core Monte Carlo simulation methods. A series of new analytical solutions of the diffusion equation for new geometries. Some original solutions in the time domain of the diffusion equation in the presence of Raman and fluorescence interactions. New MATLAB® codes of the presented solutions. A revised and enlarged set of numerical Monte Carlo results for verification of the presented solutions. An augmented bibliography covering the field of tissue optics. Although the theoretical and computational tools provided in this book have their primary use in the field of biomedical optics, there are many other applications in which they can be used, including, for example, analysis of agricultural products, study of forest canopies or clouds, and quality control of industrial food, plastic materials, or pharmaceutical products, among many others.

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Book SynopsisSeeing the Light: Optics Without Equations is written for nonscientists and explains the concepts of light, waves, photons, refraction, reflection, diffraction, etc., without using equations. This book will be useful as background information for any course in optics, for those who need a basic understanding of optics for their research or other activities, and for the curious. It is divided into five sections: Basic Concepts is followed by Optics in Nature, where the familiar phenomena we observe every day are explained without math. Next is Optical Components, which covers prisms and mirrors, followed by Optical Instruments, which includes instruments ranging from simple otoscopes to intercontinental ballistic missiles to clear air turbulence detectors. A final section on Experiments describes seminal experiments such as those that proved relativity and the wave and photon natures of light. Technical appendices are included for readers who want to dig into the math.Table of Contents Optical Phenomena Optics in Nature Components Optical Instruments Optical Experiments

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Book SynopsisThis book describes the practice of building modern light microscopes, their components, and nodes, based on optical design methodology. Examples of practical applications of this approach are presented, including numerous real design parameters of systems. Original concepts in the construction of existing and new microscope systems are provided to give readers a foundation for microscope design. Full-color micrographs illustrate the high level of image quality found in current systems.

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Book SynopsisPhoton sources enable the extension of lithography and metrology technologies forcontinued scaling of circuit elements and therefore are the key drivers for the extensionof Moore's law. This comprehensive, 28-chapter volume is the authoritative referenceon photon source technology and includes contributions from leading researchers andsuppliers in the photon source field. It is intended to meet the needs of bothpractitioners of the technology and readers seeking a thorough introduction to EUVphoton sources and their applications.Topics include a state-of-the-art overview and in-depth explanation of photons sourcerequirements, fundamental atomic data and theoretical models of EUV sources basedon discharge-produced plasmas (DPPs) and laser-produced plasmas (LPPs), a descriptionof prominent DPP and LPP designs, and other technologies for producing EUV radiationat 13.5 nm. Additionally, this volume contains detailed descriptions of 193-nm excimerlasers, UV lamps, and laser-driven plasma sources for UV photons, all of which powermany current lithography and metrology tools. CO2 lasers and 1-?m Nd-YAG lasers, usedfor pre-pulse in Sn LPP EUV sources, are also covered.Alternative photon sources for 13.5-nm lithography and metrology, such as highharmonicgeneration (HHG) and synchrotrons, along with their usage as a metrologytool, are discussed; and potential future photon sources such as free-electron lasers(FELs), solid-state 2-?m thulium lasers, and 1-?m Nd-YAG lasers are described.Additional topics include EUV source metrology, plasma diagnostics of EUV plasmas,grazing and normal incidence collector optics for plasma sources, debris mitigation, andmechanisms of component erosion in EUV sources.Table of Contents Introduction and Overview Fundamentals and Modeling High-Volume Manufacturing Sources Collector Optics and Metrology Lasers Other Sources for Lithography and Metrology

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Book SynopsisUse of Smartphones in Optical Experimentation shows how smartphone-based optical labs can be designed and realized. The book presents demonstrations of fundamental geometric and physical optical principles, including the law of reflection, the law of refraction, image formation equations, dispersion, Beer's law, polarization, Fresnel's equations, optical rotation, diffraction, interference, and blackbody radiation. Many practical applications—how to design a monochromator and a spectrometer, use the Gaussian beam of a laser, measure the colors of LED lights, and estimate the temperature of an incandescent lamp or the Sun—are also included. The experimental designs provided in this book represent only a hint of the power of leveraging the technological capability of smartphones and other low-cost materials to create a physics lab.Table of Contents Smartphones and Their Optical Sensors Experimental Data Analysis Law of Reflection Law of Refraction Image Formation Linear Polarization Fresnel Equations Brewster's Angle Optical Rotation Thin Film Interference Wedge Interference Diffraction from Gratings Structural Coloration of Butterfly Wings and Peacock Feathers Optical Rangefinder Based on Gaussian Beam of Lasers Monochromator Optical Spectrometers Dispersion Beer's Law Optical spectra of Incandescent Lightbulbs and LEDs Blackbody Radiation of the Sun Example Course Instructions for Smartphone-based Optical Labs

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Book SynopsisThis volume explores the chemical basis of lithography, with the goal of deconstructing lithography into its essential chemical principles and to situate its various aspects in specific fields of chemistry. It is organized in five parts, comprising: lithographic process chemistry, lithographic materials chemistry, lithographic photo- and radiation chemistry, chemistry of lithographic imaging mechanisms, and lithographic process-induced chemistry.With the successful implementation of EUV lithography in manufacturing at the 10-nm and 7-nm technology nodes, patterning challenges have shifted from resolution to mostly noise and sensitivity. This is a regime where the resist suffers from increased stochastic variation and the attendant effects of shot noise—a consequence of the discrete nature of photons, which, at very low number per exposure pixel, show increased variability in the response of the resist relative to its mean. Noise in this instance is the natural variation in lithographic pattern placement, shape, and size. It causes line edge roughness, line width variation, and stochastic defects.Ultimately, these patterning issues have their origin in the materials used in lithography. Chemistry underpins the essence, functions, and properties of these materials. We therefore examine in the second volume of the present edition the role of stochastics in EUV lithography in far greater detail than we did in the first edition. Equally significant, the book develops a chemistry and lithography interaction matrix, which is used as a device to explore how various aspects and practices of photolithography (or optical lithography), electron-beam lithography, ion-beam lithography, EUV lithography, imprint lithography, directed self-assembly lithography, and proximal probe lithography derive from established chemical principles and phenomena.Table of Contents Lithographic Process Chemistry Lithographic Materials Chemistry Lithographic Photochemistry and Radiation Chemistry Chemistry of Lithographic Imaging Mechanisms Lithographic-Process-Induced Chemistry

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Book SynopsisThis book presents a simple yet elegant introduction to classical optics focused primarily on establishing fundamental concepts for students new to the field. With examples demonstrating the use of optics in a wide range of practical applications, it reflects the pedagogical approach used by Prof. Mejía-Barbosa to teach his Fundamentals of Optics course at the Universidad Nacional de Colombia. This book will prove useful for undergraduate and graduate students of physics, optical science and engineering, and any other related science or engineering discipline that deals with optics at some level. Readers are invited to study the fundamental principles of optics and find pleasure in learning about this fascinating and vibrant field.Trade ReviewPolarizationInterferenceDiffractionTable of Contents Geometrical Optics

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Book SynopsisThe speckle phenomenon is ubiquitous, occurring in all regions of the electromagnetic spectrum, as well as in both ultrasound and synthetic-aperture-radar imaging. Speckle occurs whenever radiation is reflected from a surface that is rough on the scale of a wavelength or is passed through a diffusing surface that introduces random path-length delays on the scale of a wavelength. This book is devoted to simulation of speckle phenomena using the software package Python. Various techniques for simulating speckle are discussed. Simulation topics include first-order amplitude and intensity statistics, speckle phenomena in both imaging and free-space propagation, speckle at low light levels, polarization speckle, phase vortices in speckle, and speckle metrology methods.Table of Contents Introduction First-Order Statistics of Speckle Amplitude First-Order Statistics of Speckle Intensity Simulation of Speckle in Optical Imaging Simulation of Speckle in Free-Space Propagation Speckle at Low Light Levels Speckle Phase Vortices Polarization Speckle Speckle Simulation for Metrology

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Book SynopsisIt is expected that ongoing advances in optics will revolutionise the 21st century as they began doing in the last quarter of the 20th. Such fields as communications, materials science, computing and medicine are leaping forward based on developments in optics. This new series presents leading edge research on optics and lasers from researchers spanning the globe.

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Book SynopsisThis new book gathers leading research from throughout the world.

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Book SynopsisThis book the newest research on the physical properties of optical materials used in all types of lasers and optical systems. The scope includes the most important optical materials, including crystals, glasses, polymers, metals, liquids, and gases. The properties detailed include both linear and non-linear optical properties, mechanical properties, thermal properties together with many additional special properties, such as electro-, magneto-, and elasto-optic properties.

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Book SynopsisThis book is the newest research on the physical properties of optical materials used in all types of lasers and optical systems. The scope includes the most important optical materials, including crystals, glasses, polymers, metals, liquids, and gases. The properties detailed include both linear and non-linear optical properties, mechanical properties, thermal properties together with many additional special properties, such as electro-, magneto-, and elasto-optic properties.

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Book SynopsisIt is expected that ongoing advances in optics will revolutionise the 21st century as they have the last quarter of the 20th. Such fields as communications, materials science, computing and medicine are leaping forward based on developments in optics. This new volume presents leading-edge research from around the world.

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