Description

Book Synopsis

A combination of the materials science, manufacturing processes, and pioneering research and developments of SiGe and strained-Si have offered an unprecedented high level of performance enhancement at low manufacturing costs. Encompassing all of these areas, Strained-Si Heterostructure Field Effect Devices addresses the research needs associated with the front-end aspects of extending CMOS technology via strain engineering. The book provides the basis to compare existing technologies with the future technological directions of silicon heterostructure CMOS.

After an introduction to the material, subsequent chapters focus on microelectronics, engineered substrates, MOSFETs, and hetero-FETs. Each chapter presents recent research findings, industrial devices and circuits, numerous tables and figures, important references, and, where applicable, computer simulations. Topics covered include applications of strained-Si films in SiGe-based CMOS technology, electronic properties of bi

Table of Contents
Introduction. Strain Engineering in Microelectronics. Strain-Engineered Substrates. Electronic Properties of Engineered Substrates. Gate Dielectrics on Engineered Substrates. Heterostructure SiGe/SiGeC MOSFETs. Strained-Si Heterostructure MOSFETs. Modeling and Simulation of Hetero-FETs.

StrainedSi Heterostructure Field Effect Devices

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    A Hardback by C.K Maiti, S Chattopadhyay, L.K Bera

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      Book details

      Publisher Taylor & Francis
      Imprint Taylor & Francis Ltd
      Published 11 January 2007
      ISBN-13 9780750309936
      978-0750309936
      ISBN-10 0750309938
      Also in:
      Electrical engineering Microwave technology

      Description

      Book Synopsis

      A combination of the materials science, manufacturing processes, and pioneering research and developments of SiGe and strained-Si have offered an unprecedented high level of performance enhancement at low manufacturing costs. Encompassing all of these areas, Strained-Si Heterostructure Field Effect Devices addresses the research needs associated with the front-end aspects of extending CMOS technology via strain engineering. The book provides the basis to compare existing technologies with the future technological directions of silicon heterostructure CMOS.

      After an introduction to the material, subsequent chapters focus on microelectronics, engineered substrates, MOSFETs, and hetero-FETs. Each chapter presents recent research findings, industrial devices and circuits, numerous tables and figures, important references, and, where applicable, computer simulations. Topics covered include applications of strained-Si films in SiGe-based CMOS technology, electronic properties of bi

      Table of Contents
      Introduction. Strain Engineering in Microelectronics. Strain-Engineered Substrates. Electronic Properties of Engineered Substrates. Gate Dielectrics on Engineered Substrates. Heterostructure SiGe/SiGeC MOSFETs. Strained-Si Heterostructure MOSFETs. Modeling and Simulation of Hetero-FETs.

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