Description

Book Synopsis

Nanoelectronics is changing the way the world communicates, and is transforming our daily lives. Continuing Moore’s law and miniaturization of low-power semiconductor chips with ever-increasing functionality have been relentlessly driving R&D of new devices, materials, and process capabilities to meet performance, power, and cost requirements. This book covers up-to-date advances in research and industry practices in nanometrology, critical for continuing technology scaling and product innovation. It holistically approaches the subject matter and addresses emerging and important topics in semiconductor R&D and manufacturing. It is a complete guide for metrology and diagnostic techniques essential for process technology, electronics packaging, and product development and debugging—a unique approach compared to other books. The authors are from academia, government labs, and industry and have vast experience and expertise in the topics presented. The book is intended for all those involved in IC manufacturing and nanoelectronics and for those studying nanoelectronics process and assembly technologies or working in device testing, characterization, and diagnostic techniques.



Table of Contents

Model-Based Scanning Electron Microscopy Critical Dimension Metrology for 3D Nanostructures. X-Ray Metrology for Semiconductor Fabrication. Advancements in Ellipsometric and Scatterometric Analysis. 3D-AFM Measurements for Semiconductor Structures and Devices. Microstructure Characterization of Nanoscale Materials and Interconnects. Characterization of the Chemistry and Mechanical Properties of Interconnect Materials and Interfaces: Impact on Interconnect Reliability. Characterization of Plasma Damage for Low-κ Dielectric Films. Defect Characterization and Metrology. 3D Electron Tomography for Nanostructures. Methodology and Challenges in Characterization of 3D Package Interconnection Materials and Processes. 3D Interconnect Characterization using Raman Spectroscopy. Optical and Electrical Nanoprobing for Circuit Diagnostics. Automated Tools and Methods for Debugging and Diagnosis.

Metrology and Diagnostic Techniques for

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    £318.25

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    RRP £335.00 – you save £16.75 (5%)

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    A Hardback by Zhiyong Ma, David G. Seiler

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      Publisher: Pan Stanford Publishing Pte Ltd
      Publication Date: 03/10/2016
      ISBN13: 9789814745086, 978-9814745086
      ISBN10: 9814745081

      Description

      Book Synopsis

      Nanoelectronics is changing the way the world communicates, and is transforming our daily lives. Continuing Moore’s law and miniaturization of low-power semiconductor chips with ever-increasing functionality have been relentlessly driving R&D of new devices, materials, and process capabilities to meet performance, power, and cost requirements. This book covers up-to-date advances in research and industry practices in nanometrology, critical for continuing technology scaling and product innovation. It holistically approaches the subject matter and addresses emerging and important topics in semiconductor R&D and manufacturing. It is a complete guide for metrology and diagnostic techniques essential for process technology, electronics packaging, and product development and debugging—a unique approach compared to other books. The authors are from academia, government labs, and industry and have vast experience and expertise in the topics presented. The book is intended for all those involved in IC manufacturing and nanoelectronics and for those studying nanoelectronics process and assembly technologies or working in device testing, characterization, and diagnostic techniques.



      Table of Contents

      Model-Based Scanning Electron Microscopy Critical Dimension Metrology for 3D Nanostructures. X-Ray Metrology for Semiconductor Fabrication. Advancements in Ellipsometric and Scatterometric Analysis. 3D-AFM Measurements for Semiconductor Structures and Devices. Microstructure Characterization of Nanoscale Materials and Interconnects. Characterization of the Chemistry and Mechanical Properties of Interconnect Materials and Interfaces: Impact on Interconnect Reliability. Characterization of Plasma Damage for Low-κ Dielectric Films. Defect Characterization and Metrology. 3D Electron Tomography for Nanostructures. Methodology and Challenges in Characterization of 3D Package Interconnection Materials and Processes. 3D Interconnect Characterization using Raman Spectroscopy. Optical and Electrical Nanoprobing for Circuit Diagnostics. Automated Tools and Methods for Debugging and Diagnosis.

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