Description

Book Synopsis
From crystal growth to integrated devices and circuits, this new book offers a basic, up-to-date introduction to semiconductor fabrication technology, including both the theoretical and practical aspects of all major steps in the fabrication sequence.

Table of Contents
Chapter 1. Introduction.

Chapter 2. Crystal Growth.

Chapter 3. Silicon Oxidation.

Chapter 4. Photolithography.

Chapter 5. Etching.

Chapter 6. Diffusion.

Chapter 7. Ion Implantation.

Chapter 8. Film Deposition.

Chapter 9. Process Integration.

Chapter 10. IC Manufacturing.

Chapter 11. Future Trends and Challenges.

Appendix A: List of Symbols.

Appendix B: International System of Units (SI Units).

Appendix C: Unit Prefixes.

Appendix D: Greek Alphabet.

Appendix E: Physical Constants.

Appendix F: Properties of Si and GaAs at 300 K.

Appendix G: Some Properties of the Error Function.

Appendix H: Basic Kinetic Theory of Gases.

Appendix I: SUPREM Commands.

Appendix J: Running PROLITH.

Appendix K. Percentage Points of the t Distribution.

Appendix L: Percentage Points of the F Distribution.

Index.

Fundamentals of Semiconductor Fabrication

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    A Paperback / softback by Gary S. May, Simon M. Sze

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      View other formats and editions of Fundamentals of Semiconductor Fabrication by Gary S. May

      Publisher: John Wiley & Sons Inc
      Publication Date: 28/08/2007
      ISBN13: 9780471232797, 978-0471232797
      ISBN10: 0471232793
      Also in:
      Electronic devices and materials

      Description

      Book Synopsis
      From crystal growth to integrated devices and circuits, this new book offers a basic, up-to-date introduction to semiconductor fabrication technology, including both the theoretical and practical aspects of all major steps in the fabrication sequence.

      Table of Contents
      Chapter 1. Introduction.

      Chapter 2. Crystal Growth.

      Chapter 3. Silicon Oxidation.

      Chapter 4. Photolithography.

      Chapter 5. Etching.

      Chapter 6. Diffusion.

      Chapter 7. Ion Implantation.

      Chapter 8. Film Deposition.

      Chapter 9. Process Integration.

      Chapter 10. IC Manufacturing.

      Chapter 11. Future Trends and Challenges.

      Appendix A: List of Symbols.

      Appendix B: International System of Units (SI Units).

      Appendix C: Unit Prefixes.

      Appendix D: Greek Alphabet.

      Appendix E: Physical Constants.

      Appendix F: Properties of Si and GaAs at 300 K.

      Appendix G: Some Properties of the Error Function.

      Appendix H: Basic Kinetic Theory of Gases.

      Appendix I: SUPREM Commands.

      Appendix J: Running PROLITH.

      Appendix K. Percentage Points of the t Distribution.

      Appendix L: Percentage Points of the F Distribution.

      Index.

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