Description

Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available.

Stay Current with the Latest Technologies
In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on…

  • Silicon-on-insulator (SOI) materials and devices
  • Supercritical CO2 in semiconductor cleaning
  • Low-κ dielectrics
  • Atomic-layer deposition
  • Damascene copper electroplating
  • Effects of terrestrial radiation on integrated circuits (ICs)

    Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication.

    While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.

    • Handbook of Semiconductor Manufacturing Technology

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    £200.00

    Includes FREE delivery
    Usually despatched within 4 days
    Hardback by Yoshio Nishi , Robert Doering

    1 in stock

    Short Description:

    Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field,... Read more

      Publisher: Taylor & Francis Inc
      Publication Date: 09/07/2007
      ISBN13: 9781574446753, 978-1574446753
      ISBN10: 1574446754

      Number of Pages: 1720

      Non Fiction , Technology, Engineering & Agriculture , Education

      Description

      Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available.

      Stay Current with the Latest Technologies
      In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on…

    • Silicon-on-insulator (SOI) materials and devices
    • Supercritical CO2 in semiconductor cleaning
    • Low-κ dielectrics
    • Atomic-layer deposition
    • Damascene copper electroplating
    • Effects of terrestrial radiation on integrated circuits (ICs)

      Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication.

      While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.

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