Description

Book Synopsis

Chemical vapour deposition (CVD) is a vacuum deposition method used to produce high-quality, high-performance, solid materials. This is the first book to cover CVD growth processes at the atomic level using a combination of theoretical and experimental tools, including density functional theory (DFT) calculations. By demonstrating the methodology behind the modelling and simulation of CVD growth processes, the text provides guidance and practical advice on how to acquire successful theoretical results. Worked examples, case studies, end-of-chapter summaries and animations of atomic-level surface processes are included to aid learning. After reading this text, researchers and students will have the knowledge they need to tailor-make desired growth processes for the deposition of materials with specific properties.


Key Features:


  • Covers CVD growth processes at the atomic level using a combination of theoreti

Chemical Vapour Deposition

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    A Hardback by Professor Karin Larsson

    £89.10

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      Book details

      Publisher Institute of Physics Publishing
      Published 12 August 2022
      ISBN-13 9780750331050
      978-0750331050
      ISBN-10 0750331054
      Also in:
      Solid state chemistry Engineering applications of surface coatings and films

      Description

      Book Synopsis

      Chemical vapour deposition (CVD) is a vacuum deposition method used to produce high-quality, high-performance, solid materials. This is the first book to cover CVD growth processes at the atomic level using a combination of theoretical and experimental tools, including density functional theory (DFT) calculations. By demonstrating the methodology behind the modelling and simulation of CVD growth processes, the text provides guidance and practical advice on how to acquire successful theoretical results. Worked examples, case studies, end-of-chapter summaries and animations of atomic-level surface processes are included to aid learning. After reading this text, researchers and students will have the knowledge they need to tailor-make desired growth processes for the deposition of materials with specific properties.


      Key Features:


      • Covers CVD growth processes at the atomic level using a combination of theoreti

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