Description
Book SynopsisThis volume provides a broad overview of the fundamental materials science of thin films that use silicon as an active substrate or passive template, with an emphasis on opportunities and challenges for practical applications in electronics and photonics. It covers three materials classes on silicon: Semiconductors such as undoped and doped Si and SiGe, SiC, GaN, and III-V arsenides and phosphides; dielectrics including silicon nitride and high-k, low-k, and electro-optically active oxides; and metals, in particular silicide alloys. The impact of film growth and integration on physical, electrical, and optical properties, and ultimately device performance, is highlighted.
Table of ContentsForeword (Feldman); Introduction (Vijay Narayanan, Martin M Frank and Alex Demkov); Semiconductors on Si: Current Trends in Group-IV Semiconductor Epitaxy for Nanoelectronics (Jean-Michel Hartmann); Silicon Carbide on Silicon: 3C-SiC Buffer Layers for GaN LEDs (Jessica Chai, Li Wang and Sima Dimitrijev); Epitaxy of GaN on Silicon (Yu Cao, Satyaki Ganguly, Grace (Huili) Xing and Debdeep Jena); III-V Semiconductors on Silicon: Arsenides and Phosphides for QWFETs and BJTs (Dmitri Lubyshev); Dielectrics on Si: Organosilicates on Si: Low-k Dielectrics for MOSFET Interconnect Insulation (Mikhail R Baklanov, Kris Vanstreels, Chen Wu, Yunlong Li and Kristof Croes); Silicon Nitride on Si: Electronic Structure of Traps for Flash Memory (Vladimir A Gritsenko); High-k Oxides on Si: MOSFET Gate Dielectrics (Takashi Ando, Unoh Kwon, Siddarth Krishnan, Martin M Frank and Vijay Narayanan); Materials for DRAM Memory Cell Applications (Uwe Schroeder and Stefan Slesazeck); Electro-Optically Active Oxides on Silicon for Photonics (Stefan Abel and Jean Fompeyrine); Metals on Si: Silicides on Si: MOSFET Contacts (Ahmet S Ozcan);
