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Book Synopsis
This book discusses the study of simulating the growth of a thin film by chemical vapour deposition (CVD) processes. In recent years, due to the research in producing high-temperature films by depositing low pressures, the processes have increased and understanding the control mechanism of such processes has become very important. An underlying hierarchy of models for low-temperature and low-pressure plasma is presented in order to discuss the processes that can be used to implant or deposit thin layers of important materials. Due to the multi-scale problem of the flow and reaction processes, the authors propose multi-scale problems which are divided into near-field and far-field models.

Simulation of Deposition Processes with PECVD

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    A Hardback by Juergen Geiser, Meraa Arab

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      View other formats and editions of Simulation of Deposition Processes with PECVD by Juergen Geiser

      Publisher: Nova Science Publishers Inc
      Publication Date: Publication Date: 01/01/2012
      ISBN13: 9781621003656, 978-1621003656
      ISBN10: 1621003655

      Description

      Book Synopsis
      This book discusses the study of simulating the growth of a thin film by chemical vapour deposition (CVD) processes. In recent years, due to the research in producing high-temperature films by depositing low pressures, the processes have increased and understanding the control mechanism of such processes has become very important. An underlying hierarchy of models for low-temperature and low-pressure plasma is presented in order to discuss the processes that can be used to implant or deposit thin layers of important materials. Due to the multi-scale problem of the flow and reaction processes, the authors propose multi-scale problems which are divided into near-field and far-field models.

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