Description
Book SynopsisProvides a treatment of the chemical phenomena in lithography. This book presents topics on the optical and charged particle physics practiced in lithography, with a view of how the marriage between chemistry and optics has made possible the print and electronic revolutions of the digital age.
Table of ContentsIntroduction; Invention of Lithography and Photolithography; Chemical and Optical Origins of Lithography; Evolution of Lithography; Lithographic Chemicals and Materials; Negative Resists; Positive Resists; General Considerations on the Radiation and Photochemistry of Resists; Anti-Reflection Coatings; Stone, Plate and Offset Lithography; The Semiconductor Lithographic Process; Lithographic Modeling; Optical Lithography; Charged Particle Lithography; Implementation of Lithography in Integrated Circuit Device Fabrication; Advanced Lithographic Processing.
