Description
Book SynopsisChemical Vapour Deposition (CVD) involves the deposition of thin solid films from chemical precursors in the vapour phase, and encompasses a variety of deposition techniques, including a range of thermal processes, plasma enhanced CVD (PECVD), photon- initiated CVD, and atomic layer deposition (ALD). The development of CVD technology owes a great deal to collaboration between different scientific disciplines such as chemistry, physics, materials science, engineering and microelectronics, and the publication of this book will promote and stimulate continued dialogue between scientists from these different research areas. The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressiv
Trade Review"...Timely and welcome...comprehensive, well-presented and refreshingly readable."...this book will be very useful to a broad readership, including chemists, engineers and students." * Chemistry and Industry, John Colligon, Manchester Met University. *
Table of ContentsAn overview of CVD processes CVD reactors and delivery systems Modeling CVD processes ALD processes Basic chemistry of CVD precursors MOCVD of III-V semiconductors MOCVD of II-VI semiconductors CVD of metals CVD of oxides used in microelectronics CVD of metal nitride films CVD of functional coatings on glass CVD of optical coatings CVD of hard protective coatings Photon-assisted MOCVD processes Plasma-assisted MOCVD processes Commercial aspects of CVD
