Description
Book SynopsisChemical vapor deposition (CVD) refers to a vacuum deposition method used to produce high quality, high-performance, solid materials in a variety of manufacturing industries. Chapter One provides a critical review of published experimental data for thin films of silicon nitride deposited by thermal and plasma CVD, plasma CVD, high density plasma CVD, atomic layer-by-layer deposition, and hot-wire CVD. Chapter Two describes several aspects of the use of CVD for single-crystal diamond synthesis for electronics. Chapter Three describes the properties of graphene and its preparation by a number of methods with a focus on the classical CVD method on copper foil together with graphene transfer onto a dielectric substrate.
Table of ContentsPreface; CVD Technologies and Basic Properties of SiNH-Contained Thin Films for Applications in Electronic Devices; Rapid-Heating Criterion in CVD Diamond Growth Technology and Possibility of Synthesizing Large Diamonds without High Pressure and Prepared Substrate; Graphene Preparation by Chemical Vapour Deposition Method and its Basic Parameters; Index.
