{"product_id":"optical-and-euv-lithography-a-modeling-perspective-9781510639010","title":"Optical and EUV Lithography: A Modeling","description":"\u003cb\u003eBook Synopsis\u003c\/b\u003e\u003cbr\u003eState-of-the-art semiconductor lithography combines the most advanced optical systems of our world with cleverly designed and highly optimized photochemical materials and processes to fabricate micro- and nanostructures that enable our modern information society. The precise fabrication and characterization of nanopatterns requires an in-depth understanding of all involved physical and chemical effects. This book supports such an understanding from a model-driven perspective, but without a heavy mathematical emphasis. The material for the book was compiled during many years of lecturing on optical lithography technology, physical effects, and modeling at the Friedrich-Alexander-University Erlangen-Nuremberg and in preparation for dedicated courses on special aspects of lithography. The book is intended to introduce interested students with backgrounds in physics, optics, computational engineering, mathematics, chemistry, material science, nanotechnology, and other areas to the fascinating field of lithographic techniques for nanofabrication. It should also help senior engineers and managers expand their knowledge of alternative methods and applications.\u003cbr\u003e\u003cbr\u003e\u003cb\u003eTable of Contents\u003c\/b\u003e\u003cbr\u003e\u003cul\u003e\n\u003cli\u003eOverview of Lithographic Processing\u003c\/li\u003e\n\u003cli\u003eImage Formation in Projection Lithography\u003c\/li\u003e\n\u003cli\u003ePhotoresists\u003c\/li\u003e\n\u003cli\u003eOptical Resolution Enhancements\u003c\/li\u003e\n\u003cli\u003eMaterial-Driven Resolution Enhancements\u003c\/li\u003e\n\u003cli\u003eLithography with Extreme-Ultraviolet Light\u003c\/li\u003e\n\u003cli\u003eOptical Lithography Beyond Projection Imaging\u003c\/li\u003e\n\u003cli\u003eLithographic Projection Systems: Advanced Topics\u003c\/li\u003e\n\u003cli\u003eMask and Wafer Topography Effects in Lithography\u003c\/li\u003e\n\u003cli\u003eStochastic Effects in Advanced Lithography\u003c\/li\u003e\n\u003c\/ul\u003e","brand":"SPIE Press","offers":[{"title":"Default Title","offer_id":51040925188439,"sku":"9781510639010","price":64.0,"currency_code":"GBP","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0817\/1739\/5799\/files\/9781510639010.jpg?v=1750948303","url":"https:\/\/bookcurl.com\/products\/optical-and-euv-lithography-a-modeling-perspective-9781510639010","provider":"Book Curl","version":"1.0","type":"link"}