{"product_id":"fundamental-principles-of-optical-lithography-9780470727300","title":"Fundamental Principles of Optical Lithography","description":"\u003cb\u003eBook Synopsis\u003c\/b\u003e\u003cbr\u003eFundamental Principles of Optical Lithography: The Science of Microfabrication  presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. This sole-authored text includes optional computer simulation exercises as well as problems at the end of each chapter.\u003cbr\u003e\u003cbr\u003e\u003cb\u003eTable of Contents\u003c\/b\u003e\u003cbr\u003ePreface.  \u003cp\u003e\u003cb\u003e1. Introduction to Semiconductor Lithography.\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e1.1 Basics of IC Fabrication.\u003c\/p\u003e \u003cp\u003e1.2 Moore’s Law and the Semiconductor Industry.\u003c\/p\u003e \u003cp\u003e1.3 Lithography Processing.\u003c\/p\u003e \u003cp\u003eProblems.\u003c\/p\u003e \u003cp\u003e\u003cb\u003e2. Aerial Image Formation – The Basics.\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e2.1 Mathematical Description of Light.\u003c\/p\u003e \u003cp\u003e2.2 Basic Imaging Theory.\u003c\/p\u003e \u003cp\u003e2.3 Partial Coherence.\u003c\/p\u003e \u003cp\u003e2.4 Some Imaging Examples.\u003c\/p\u003e \u003cp\u003eProblems.\u003c\/p\u003e \u003cp\u003e\u003cb\u003e3. Aerial Image Formation – The Details.\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e3.1 Aberrations.\u003c\/p\u003e \u003cp\u003e3.2 Pupil Filters and Lens Apodization.\u003c\/p\u003e \u003cp\u003e3.3 Flare.\u003c\/p\u003e \u003cp\u003e3.4 Defocus.\u003c\/p\u003e \u003cp\u003e3.5 Imaging with Scanners Versus Steppers.\u003c\/p\u003e \u003cp\u003e3.6 Vector Nature of Light.\u003c\/p\u003e \u003cp\u003e3.7 Immersion Lithography.\u003c\/p\u003e \u003cp\u003e3.8 Image Quality.\u003c\/p\u003e \u003cp\u003eProblems.\u003c\/p\u003e \u003cp\u003e\u003cb\u003e4. Imaging in Resist: Standing Waves and Swing Curves.\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e4.1 Standing Waves.\u003c\/p\u003e \u003cp\u003e4.2 Swing Curves.\u003c\/p\u003e \u003cp\u003e4.3 Bottom Antirefl ection Coatings.\u003c\/p\u003e \u003cp\u003e4.4 Top Antirefl ection Coatings.\u003c\/p\u003e \u003cp\u003e4.5 Contrast Enhancement Layer.\u003c\/p\u003e \u003cp\u003e4.6 Impact of the Phase of the Substrate Refl ectance.\u003c\/p\u003e \u003cp\u003e4.7 Imaging in Resist.\u003c\/p\u003e \u003cp\u003e4.8 Defi ning Intensity.\u003c\/p\u003e \u003cp\u003eProblems.\u003c\/p\u003e \u003cp\u003e\u003cb\u003e5. Conventional Resists: Exposure and Bake Chemistry.\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e5.1 Exposure.\u003c\/p\u003e \u003cp\u003e5.2 Post-Apply Bake.\u003c\/p\u003e \u003cp\u003e5.3 Post-exposure Bake Diffusion.\u003c\/p\u003e \u003cp\u003e5.4 Detailed Bake Temperature Behavior.\u003c\/p\u003e \u003cp\u003e5.5 Measuring the \u003ci\u003eABC\u003c\/i\u003e Parameters.\u003c\/p\u003e \u003cp\u003eProblems.\u003c\/p\u003e \u003cp\u003e\u003cb\u003e6. Chemically Amplifi ed Resists: Exposure and Bake Chemistry.\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e6.1 Exposure Reaction.\u003c\/p\u003e \u003cp\u003e6.2 Chemical Amplifi cation.\u003c\/p\u003e \u003cp\u003e6.3 Measuring Chemically Amplifi ed Resist Parameters.\u003c\/p\u003e \u003cp\u003e6.4 Stochastic Modeling of Resist Chemistry.\u003c\/p\u003e \u003cp\u003eProblems.\u003c\/p\u003e \u003cp\u003e\u003cb\u003e7. Photoresist Development.\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e7.1 Kinetics of Development.\u003c\/p\u003e \u003cp\u003e7.2 The Development Contrast.\u003c\/p\u003e \u003cp\u003e7.3 The Development Path.\u003c\/p\u003e \u003cp\u003e7.4 Measuring Development Rates.\u003c\/p\u003e \u003cp\u003eProblems.\u003c\/p\u003e \u003cp\u003e\u003cb\u003e8. Lithographic Control in Semiconductor Manufacturing.\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e8.1 Defi ning Lithographic Quality.\u003c\/p\u003e \u003cp\u003e8.2 Critical Dimension Control.\u003c\/p\u003e \u003cp\u003e8.3 How to Characterize Critical Dimension Variations.\u003c\/p\u003e \u003cp\u003e8.4 Overlay Control.\u003c\/p\u003e \u003cp\u003e8.5 The Process Window.\u003c\/p\u003e \u003cp\u003e8.6 H–V Bias.\u003c\/p\u003e \u003cp\u003e8.7 Mask Error Enhancement Factor (MEEF).\u003c\/p\u003e \u003cp\u003e8.8 Line-End Shortening.\u003c\/p\u003e \u003cp\u003e8.9 Critical Shape and Edge Placement Errors.\u003c\/p\u003e \u003cp\u003e8.10 Pattern Collapse.\u003c\/p\u003e \u003cp\u003eProblems.\u003c\/p\u003e \u003cp\u003e\u003cb\u003e9. Gradient-Based Lithographic Optimization: Using the Normalized Image Log-Slope.\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e9.1 Lithography as Information Transfer.\u003c\/p\u003e \u003cp\u003e9.2 Aerial Image.\u003c\/p\u003e \u003cp\u003e9.3 Image in Resist.\u003c\/p\u003e \u003cp\u003e9.4 Exposure.\u003c\/p\u003e \u003cp\u003e9.5 Post-exposure Bake.\u003c\/p\u003e \u003cp\u003e9.6 Develop.\u003c\/p\u003e \u003cp\u003e9.7 Resist Profi le Formation.\u003c\/p\u003e \u003cp\u003e9.8 Line Edge Roughness.\u003c\/p\u003e \u003cp\u003e9.9 Summary.\u003c\/p\u003e \u003cp\u003eProblems.\u003c\/p\u003e \u003cp\u003e\u003cb\u003e10. Resolution Enhancement Technologies.\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e10.1 Resolution.\u003c\/p\u003e \u003cp\u003e10.2 Optical Proximity Correction (OPC).\u003c\/p\u003e \u003cp\u003e10.3 Off-Axis Illumination (OAI).\u003c\/p\u003e \u003cp\u003e10.4 Phase-Shifting Masks (PSM).\u003c\/p\u003e \u003cp\u003e10.5 Natural Resolutions.\u003c\/p\u003e \u003cp\u003eProblems.\u003c\/p\u003e \u003cp\u003eAppendix A. Glossary of Microlithographic Terms.\u003c\/p\u003e \u003cp\u003eAppendix B. Curl, Divergence, Gradient, Laplacian.\u003c\/p\u003e \u003cp\u003eAppendix C. The Dirac Delta Function.\u003c\/p\u003e \u003cp\u003eIndex.\u003c\/p\u003e","brand":"John Wiley \u0026 Sons Inc","offers":[{"title":"Default Title","offer_id":49402419970391,"sku":"9780470727300","price":55.05,"currency_code":"GBP","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0817\/1739\/5799\/files\/9780470727300.jpg?v=1730480345","url":"https:\/\/bookcurl.com\/products\/fundamental-principles-of-optical-lithography-9780470727300","provider":"Book Curl","version":"1.0","type":"link"}