{"product_id":"crystal-growth-technology-9780471495246","title":"Crystal Growth Technology","description":"\u003cb\u003eBook Synopsis\u003c\/b\u003e\u003cbr\u003eCrystal growth technology involve processes for the production of crystals and multilayers which are essential for microelectronics, communication technologies, lasers and energy-producing and energy-saving technologies. This title presents a complete survey of this important interdisciplinary field.\u003cbr\u003e\u003cbr\u003e\u003cb\u003eTable of Contents\u003c\/b\u003e\u003cbr\u003eContributors.\u003cbr\u003e \u003cbr\u003e Preface.\u003cbr\u003e \u003cbr\u003e PART 1: GENERAL ASPECTS OF CRYSTAL GROWTH TECHNOLOGY.\u003cbr\u003e \u003cbr\u003e 1. The Development of Crystal Growth Technology (H. J. ScheelI).\u003cbr\u003e \u003cbr\u003e Abstract.\u003cbr\u003e \u003cbr\u003e References.\u003cbr\u003e \u003cbr\u003e 2. Thermodynamic Fundamentals of Phase Transitions Applied to Crystal Growth Processes (P. Rudolph).\u003cbr\u003e \u003cbr\u003e References.\u003cbr\u003e \u003cbr\u003e 3. Interface-kinetics-driven Facet Formation During Melt Growth of Oxide Crystals (S. Brandon, A. Virozub and Y. Liu).\u003cbr\u003e \u003cbr\u003e Abstract.\u003cbr\u003e \u003cbr\u003e Acknowledgments.\u003cbr\u003e \u003cbr\u003e Note Added in Proof.\u003cbr\u003e \u003cbr\u003e References.\u003cbr\u003e \u003cbr\u003e 4. Theoretical and Experimental Solutions of the Striation Problem (H. J. Scheel).\u003cbr\u003e \u003cbr\u003e Abstract.\u003cbr\u003e \u003cbr\u003e References.\u003cbr\u003e \u003cbr\u003e 5. High-resolution X-Ray Diffraction Techniques for Structural Characterization of Silicon and other Advanced Materials (K. Lal).\u003cbr\u003e \u003cbr\u003e References.\u003cbr\u003e \u003cbr\u003e 6. Computational Simulations of the Growth of Crystals from Liquids (A. Yeckel and J. J. Derby).\u003cbr\u003e \u003cbr\u003e Acknowledgments.\u003cbr\u003e \u003cbr\u003e References.\u003cbr\u003e \u003cbr\u003e 7. Heat and Mass Transfer under Magnetic Fields (K. Kakimoto).\u003cbr\u003e \u003cbr\u003e Abstract.\u003cbr\u003e \u003cbr\u003e Acknowledgment.\u003cbr\u003e \u003cbr\u003e References.\u003cbr\u003e \u003cbr\u003e 8. Modeling of Technologically Important Hydrodynamics and Heat\/Mass Transfer Processes during Crystal Growth (V. I. Polezhaev).\u003cbr\u003e \u003cbr\u003e Acknowledgments.\u003cbr\u003e \u003cbr\u003e References.\u003cbr\u003e \u003cbr\u003e PART 2: SILICON.\u003cbr\u003e \u003cbr\u003e 9. Influence of Boron Addition on Oxygen Behavior in Silicon Melts (K. Terashima).\u003cbr\u003e \u003cbr\u003e Abstract.\u003cbr\u003e \u003cbr\u003e Acknowledgments.\u003cbr\u003e \u003cbr\u003e References.\u003cbr\u003e \u003cbr\u003e 10. Octahedral Void Defects in Czochralski Silicon (M. Itsumi).\u003cbr\u003e \u003cbr\u003e References.\u003cbr\u003e \u003cbr\u003e 11. The Control and Engineering of Intrinsic Point Defects in Silicon Wafers and Crystals (R. Falster, V. V. Voronkov and P. Mutti).\u003cbr\u003e \u003cbr\u003e Abstract.\u003cbr\u003e \u003cbr\u003e Acknowledgments.\u003cbr\u003e \u003cbr\u003e References.\u003cbr\u003e \u003cbr\u003e 12. The Formation of Defects and Growth Interface Shapes in CZ Silicon (T. Abe).\u003cbr\u003e \u003cbr\u003e Abstract.\u003cbr\u003e \u003cbr\u003e References.\u003cbr\u003e \u003cbr\u003e 13. Silicon Crystal Growth for Photovoltaics (T. F. Ciszek).\u003cbr\u003e \u003cbr\u003e References.\u003cbr\u003e \u003cbr\u003e PART 3: COMPOUND SEMICONDUCTORS.\u003cbr\u003e \u003cbr\u003e 14. Fundamental and Technological Aspects of Czochralski Growth of High-quality Semi-insulating GaAs Crystals (P. Rudolph and M. Jurisch).\u003cbr\u003e \u003cbr\u003e Acknowledgement.\u003cbr\u003e \u003cbr\u003e References.\u003cbr\u003e \u003cbr\u003e 15. Growth of III-V and II-VI Single Crystals by the Verticalgradient-freeze Method (T. Asahi, K. Kainosho, K. Kohiro, A. Noda, K. Sato and O. Oda).\u003cbr\u003e \u003cbr\u003e References.\u003cbr\u003e \u003cbr\u003e 16. Growth Technology of III-V Single Crystals for Production (T. Kawase, M. Tatsumi and Y. Nishida).\u003cbr\u003e \u003cbr\u003e References.\u003cbr\u003e \u003cbr\u003e 17. CdTe and CdZnTe Growth (R. Triboulet).\u003cbr\u003e \u003cbr\u003e References.\u003cbr\u003e \u003cbr\u003e PART 4: OXIDES AND HALIDES.\u003cbr\u003e \u003cbr\u003e 18. Phase-diagram Study for Growing Electro-optic Single Crystals (S. Miyazawa).\u003cbr\u003e \u003cbr\u003e Abstract.\u003cbr\u003e \u003cbr\u003e Acknowledgment.\u003cbr\u003e \u003cbr\u003e References.\u003cbr\u003e \u003cbr\u003e 19. Melt Growth of Oxide Crystals for SAW, Piezoelectric, and Nonlinear-Optical Applications (K. Shimamura, T. Fukuda and V. I. Chani).\u003cbr\u003e \u003cbr\u003e References.\u003cbr\u003e \u003cbr\u003e 20. Growth of Nonlinear-optical Crystals for Laser-frequency Conversion (T. Sasaki, Y. Mori and M. Yoshimura).\u003cbr\u003e \u003cbr\u003e References.\u003cbr\u003e \u003cbr\u003e 21. Growth of Zirconia Crystals by Skull-Melting Technique (E. E. Lomonova and V. V. Osiko).\u003cbr\u003e \u003cbr\u003e Acknowledgments.\u003cbr\u003e \u003cbr\u003e References.\u003cbr\u003e \u003cbr\u003e 22. Shaped Sapphire Production (L. A. Lytvynov).\u003cbr\u003e \u003cbr\u003e References.\u003cbr\u003e \u003cbr\u003e 23. Halogenide Scintillators: Crystal Growth and Performance (A. V. Gektin and B. G. Zaslavsky).\u003cbr\u003e \u003cbr\u003e References.\u003cbr\u003e \u003cbr\u003e PART 5: CRYSTAL MACHINING.\u003cbr\u003e \u003cbr\u003e 24. Advanced Slicing Techniques for Single Crystals (C. Hauser and P. M. Nasch).\u003cbr\u003e \u003cbr\u003e Abstract.\u003cbr\u003e \u003cbr\u003e References.\u003cbr\u003e \u003cbr\u003e 25. Methods and Tools for Mechanical Processing of Anisotropic Scintillating Crystals (M. Lebeau).\u003cbr\u003e \u003cbr\u003e References.\u003cbr\u003e \u003cbr\u003e 26. Plasma-CVM (Chemical Vaporization Machining) (Y. Mori, K. Yamamura, and Y. Sano).\u003cbr\u003e \u003cbr\u003e Acknowledgements.\u003cbr\u003e \u003cbr\u003e References.\u003cbr\u003e \u003cbr\u003e 27. Numerically Controlled EEM (Elastic Emission Machining) System for Ultraprecision Figuring and Smoothing of Aspherical Surfaces (Y. Mori, K. Yamauchi, K. Hirose, K. Sugiyama, K. Inagaki and H. Mimura).\u003cbr\u003e \u003cbr\u003e Acknowledgement.\u003cbr\u003e \u003cbr\u003e References.\u003cbr\u003e \u003cbr\u003e PART 6: EPITAXY AND LAYER DEPOSITION.\u003cbr\u003e \u003cbr\u003e 28. Control of Epitaxial Growth Modes for High-performance Devices (H. J. Scheel).\u003cbr\u003e \u003cbr\u003e Abstract.\u003cbr\u003e \u003cbr\u003e General References.\u003cbr\u003e \u003cbr\u003e References.\u003cbr\u003e \u003cbr\u003e 29. High-rate Deposition of Amorphous Silicon Films by Atmospheric pressure Plasma Chemical Vapor Deposition (Y. Mori, H. Kakiuchi, K. Yoshii and K. Yasutake).\u003cbr\u003e \u003cbr\u003e Abstract.\u003cbr\u003e \u003cbr\u003e Acknowledgements.\u003cbr\u003e \u003cbr\u003e References.\u003cbr\u003e \u003cbr\u003e Index.","brand":"John Wiley \u0026 Sons Inc","offers":[{"title":"Default Title","offer_id":49402615202135,"sku":"9780471495246","price":144.85,"currency_code":"GBP","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0817\/1739\/5799\/files\/9780471495246.jpg?v=1730480973","url":"https:\/\/bookcurl.com\/products\/crystal-growth-technology-9780471495246","provider":"Book Curl","version":"1.0","type":"link"}