{"product_id":"chemistry-and-lithography-9781118030028","title":"Chemistry and Lithography","description":"\u003cb\u003eBook Synopsis\u003c\/b\u003e\u003cbr\u003eThis book will be of interest to all involved in the semiconductor industry. Offering a complete overview of the topic of lithography it will be of interest to practitioners, researchers and students. Chemists, Electrical Engineers, chip designers and manufacturers. Conferences: OSA, ISSCC, ISCS, EMC, ICASSP.\u003cbr\u003e\u003cbr\u003e\u003cb\u003eTable of Contents\u003c\/b\u003e\u003cbr\u003ePreface.  \u003cp\u003eAcronyms and Abbreviations.\u003c\/p\u003e \u003cp\u003e\u003cb\u003ePart I. Origins, Inventions, and the Evolution of Lithography.\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e\u003cb\u003e1. Introduction to Lithography.\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e\u003cb\u003e2. Invention of Lithography and Photolithography.\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e2.1 Introduction.\u003c\/p\u003e \u003cp\u003e2.2 Invention of Lithography.\u003c\/p\u003e \u003cp\u003e2.3 Invention of Photolithography.\u003c\/p\u003e \u003cp\u003e2.4 Pioneers of Photography.\u003c\/p\u003e \u003cp\u003e\u003cb\u003e3. Optical and Chemical Origins of Lithography.\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e3.1 Introduction.\u003c\/p\u003e \u003cp\u003e3.2 Key Developments that Enabled the Invention and Development of Lithography.\u003c\/p\u003e \u003cp\u003e\u003cb\u003e4. Evolution and Lithography.\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e4.1 Introduction.\u003c\/p\u003e \u003cp\u003e4.2 Offset Lithography.\u003c\/p\u003e \u003cp\u003e4.3 The Printed Circuit Board and the Development of the Electronics Industry.\u003c\/p\u003e \u003cp\u003e4.4 The Transistor and Microelectronics Revolution.\u003c\/p\u003e \u003cp\u003e4.5 The Integrated Circuit.\u003c\/p\u003e \u003cp\u003e4.6 Other Notable Developments in Transistor Technology.\u003c\/p\u003e \u003cp\u003e4.7 Overall Device Technology Trends.\u003c\/p\u003e \u003cp\u003e4.8 Semiconductor Lithography.\u003c\/p\u003e \u003cp\u003e4.9 X-ray Lithography.\u003c\/p\u003e \u003cp\u003e4.10 Electron-Beam Lithography.\u003c\/p\u003e \u003cp\u003e4.11 Ion-Beam Lithography.\u003c\/p\u003e \u003cp\u003e4.12 Extreme Ultraviolet Lithography.\u003c\/p\u003e \u003cp\u003e4.13 Soft Lithography.\u003c\/p\u003e \u003cp\u003e4.14 Proximal Probe Lithography.\u003c\/p\u003e \u003cp\u003e4.15 Atom Lithography.\u003c\/p\u003e \u003cp\u003e4.16 Stereolithography.\u003c\/p\u003e \u003cp\u003e4.17 Molecular Self-Assembly Lithography.\u003c\/p\u003e \u003cp\u003e\u003cb\u003ePart II. Lithographic Chemicals\u003c\/b\u003e.\u003c\/p\u003e \u003cp\u003e\u003cb\u003e5. Lithographic Chemicals.\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e5.1 Introduction.\u003c\/p\u003e \u003cp\u003e5.2 Resists.\u003c\/p\u003e \u003cp\u003e5.3 Antireflection Coatings.\u003c\/p\u003e \u003cp\u003e5.4 Resist Developers and Rinses.\u003c\/p\u003e \u003cp\u003e5.5 Resist Strippers and Cleaners.\u003c\/p\u003e \u003cp\u003e5.6 Offset Lithographic Inks and Fountain Solutions.\u003c\/p\u003e \u003cp\u003e\u003cb\u003e6. Negative Resists.\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e6.1 Introduction.\u003c\/p\u003e \u003cp\u003e6.2 Resins.\u003c\/p\u003e \u003cp\u003e6.3 Types and Negative Resists.\u003c\/p\u003e \u003cp\u003e6.4 General Considerations on the Chemistry of Cross-Linking.\u003c\/p\u003e \u003cp\u003e6.5 Negative Resists Arising from Polymerization of Monomers.\u003c\/p\u003e \u003cp\u003e6.6 General Considerations on the Chemistry of Photoinitiated.\u003c\/p\u003e \u003cp\u003e6.7 General Considerations of Photoinitiated Condensation Polymerization.\u003c\/p\u003e \u003cp\u003e6.8 General Considerations on the Photoinitiated Cationic Polymerization Employed in Negative Resist Systems.\u003c\/p\u003e \u003cp\u003e6.9 Practical Negative Resist Compositions Arising from Photopolymerization of Monomers in the Presence of Polyfunctional Components.\u003c\/p\u003e \u003cp\u003e6.19 Lithographic Applications of Photopolymerization Negative Resists.\u003c\/p\u003e \u003cp\u003e\u003cb\u003e7. Positive Resists.\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e7.1 Introduction.\u003c\/p\u003e \u003cp\u003e7.2 Types of Positive Resists.\u003c\/p\u003e \u003cp\u003e7.3 Resist Materials for Multilayer Resist Systems.\u003c\/p\u003e \u003cp\u003e\u003cb\u003e8. General Considerations on the Radiation and Photochemistry of Resists.\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e8.1 Interaction of Radiation with Resists.\u003c\/p\u003e \u003cp\u003e8.2 Excited State Complexes.\u003c\/p\u003e \u003cp\u003e8.3 Energy Transfer.\u003c\/p\u003e \u003cp\u003e8.4 Energy Migration in Resist Polymers.\u003c\/p\u003e \u003cp\u003e8.5 Spectral Sensitization.\u003c\/p\u003e \u003cp\u003e8.6 Sensitization by Energy Transfer.\u003c\/p\u003e \u003cp\u003e8.7 Radiation Chemistry Versus Photochemistry of Resists.\u003c\/p\u003e \u003cp\u003e8.8 Radiation Chemical Yield and Dosimetry.\u003c\/p\u003e \u003cp\u003e8.9 Radiation Chemistry of Polymers.\u003c\/p\u003e \u003cp\u003e8.10 Sensitive and Exposure Radiation.\u003c\/p\u003e \u003cp\u003e8.11 Exposure Mechanisms of Resists and Exposure Radiation.\u003c\/p\u003e \u003cp\u003e\u003cb\u003e9. Antireflection Coatings and Reflectivity Control.\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e9.1 Introduction.\u003c\/p\u003e \u003cp\u003e9.2 Antireflection Coating Strategies.\u003c\/p\u003e \u003cp\u003e9.3 Bottom Antireflection Coatings.\u003c\/p\u003e \u003cp\u003e9.4 Applications of Bottom Antireflection Coatings.\u003c\/p\u003e \u003cp\u003e9.5 Organic versus Inorganic Bottom Antireflection Coating and Rework\/Stripping Issues.\u003c\/p\u003e \u003cp\u003e9.6 Bottom Antireflection Coating-Resist Interactions.\u003c\/p\u003e \u003cp\u003e9.7 Theory of Bottom Antireflection Coatings.\u003c\/p\u003e \u003cp\u003e9.8 Bottom Antireflection Coatings for High-NA Imaging.\u003c\/p\u003e \u003cp\u003e\u003cb\u003ePart III. The Practice of Lithography.\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e\u003cb\u003e10. Stone, Plate, and Offset Lithography.\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e10.1 Stone and Plate Lithography.\u003c\/p\u003e \u003cp\u003e10.2 Offset Lithography.\u003c\/p\u003e \u003cp\u003e10.3 The Offset Lithographic Press.\u003c\/p\u003e \u003cp\u003e10.4 Components of an Offset Lithographic Press.\u003c\/p\u003e \u003cp\u003e10.5 Types of Offset Lithographic Inks.\u003c\/p\u003e \u003cp\u003e10.6 Fabrication of Lithographic Offset Plates.\u003c\/p\u003e \u003cp\u003e10.7 The Offset Lithographic Process.\u003c\/p\u003e \u003cp\u003e10.8 Waterless Offset Lithography.\u003c\/p\u003e \u003cp\u003e\u003cb\u003e11. The Semiconductor Lithographic Process.\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e11.1 Introduction.\u003c\/p\u003e \u003cp\u003e11.2 Adhesion Promotion.\u003c\/p\u003e \u003cp\u003e11.3 Resist Coating.\u003c\/p\u003e \u003cp\u003e11.4 Characterizing Ultrathin Resist Processes.\u003c\/p\u003e \u003cp\u003e11.5 Soft Bake\/Prebake.\u003c\/p\u003e \u003cp\u003e11.6 Alignment.\u003c\/p\u003e \u003cp\u003e11.7 Exposure.\u003c\/p\u003e \u003cp\u003e11.8 Postexposure Bake.\u003c\/p\u003e \u003cp\u003e11.9 Monitoring Photoacid Generation in Thin Photoresist Films by Means of Fluorescence Spectroscopy.\u003c\/p\u003e \u003cp\u003e11.10 Postexposure Bake Sensitivity.\u003c\/p\u003e \u003cp\u003e11.11 Consequences of Acid Diffusion.\u003c\/p\u003e \u003cp\u003e11.12 Development.\u003c\/p\u003e \u003cp\u003e11.13 Dissolution Mechanism of Resist Polymers.\u003c\/p\u003e \u003cp\u003e11.14 Dissolution Mechanism of Phenolic Resists.\u003c\/p\u003e \u003cp\u003e11.15 Comparison of Dissolution Characteristics of Novolac and Poly(hydroxystyrene)-based Resists.\u003c\/p\u003e \u003cp\u003e11.16 General Facts about the Dissolution Mechanism of DNQ\/Novolac Resists.\u003c\/p\u003e \u003cp\u003e11.17 Resist Development Issues.\u003c\/p\u003e \u003cp\u003e11.8 Postdevelopment Bake and Resist Stabilization Treatments.\u003c\/p\u003e \u003cp\u003e11.19 Measurement and Inspection.\u003c\/p\u003e \u003cp\u003e11.20 Etching.\u003c\/p\u003e \u003cp\u003e11.21 Rework\/Stripping.\u003c\/p\u003e \u003cp\u003e\u003cb\u003e12. Lithographic Modeling.\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e12.1 Introduction.\u003c\/p\u003e \u003cp\u003e12.2 Historical Background.\u003c\/p\u003e \u003cp\u003e12.3 Structure of a Lithographic Model.\u003c\/p\u003e \u003cp\u003e12.4 Basic Imaging Theory.\u003c\/p\u003e \u003cp\u003e12.5 Accounting for Aberrations.\u003c\/p\u003e \u003cp\u003e12.6 Aerial Image Formation Models.\u003c\/p\u003e \u003cp\u003e12.7 Standing Wave Models.\u003c\/p\u003e \u003cp\u003e12.8 Exposure Models.\u003c\/p\u003e \u003cp\u003e12.9 Postexposure Bake Models.\u003c\/p\u003e \u003cp\u003e12.10 Development Models.\u003c\/p\u003e \u003cp\u003e12.11 Accuracy of Lithographic Models.\u003c\/p\u003e \u003cp\u003e12.12 Applications\/Uses of Lithographic Modeling.\u003c\/p\u003e \u003cp\u003e\u003cb\u003e13. Optical Lithography.\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e13.1 Introduction.\u003c\/p\u003e \u003cp\u003e13.2 Elements of Optical Lithography.\u003c\/p\u003e \u003cp\u003e13.3 UV Photochemistry in the Exposure Chamber.\u003c\/p\u003e \u003cp\u003e13.4 Optical Materials for UV and Visible Light Lithographies.\u003c\/p\u003e \u003cp\u003e13.5 Printing Modes.\u003c\/p\u003e \u003cp\u003e13.6 General Considerations on Optics Relevant to Lithography.\u003c\/p\u003e \u003cp\u003e13.7 Optical Lithographic Technologies and Their Performance.\u003c\/p\u003e \u003cp\u003e\u003cb\u003e14. X-Ray and Extreme Ultraviolet Lithographies.\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e14.1 Introduction.\u003c\/p\u003e \u003cp\u003e14.2 Proximity X-Ray Lithography.\u003c\/p\u003e \u003cp\u003e14.3 Extreme Ultraviolet Lithography.\u003c\/p\u003e \u003cp\u003e14.4 Optics Lifetime.\u003c\/p\u003e \u003cp\u003e14.5 Contamination Processes.\u003c\/p\u003e \u003cp\u003e14.6 Contamination Mitigation Strategies.\u003c\/p\u003e \u003cp\u003e16.7 EUV Resists and Imaging Performance.\u003c\/p\u003e \u003cp\u003e\u003cb\u003e15. Charged Particle Lithography.\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e15.1 Introduction.\u003c\/p\u003e \u003cp\u003e15.2 Electron-Beam Lithography.\u003c\/p\u003e \u003cp\u003e15.3 Types of Electron-Beam Lithographies.\u003c\/p\u003e \u003cp\u003e15.4 Electron Projection Lithography.\u003c\/p\u003e \u003cp\u003e15.5 Ion-Beam Lithography.\u003c\/p\u003e \u003cp\u003e\u003cb\u003e16. Lithography in Integrated Circuit Device Fabrication.\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e16.1 Introduction.\u003c\/p\u003e \u003cp\u003e16.2 Fabrication of a 90-nm CMOS Microprocessor.\u003c\/p\u003e \u003cp\u003e\u003cb\u003e17. Advanced Resist Processing and Resist Resolution Limit Issues.\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e17.1 Introduction.\u003c\/p\u003e \u003cp\u003e17.2 Resist Systems.\u003c\/p\u003e \u003cp\u003e17.3 Advanced Resist Processing Techniques.\u003c\/p\u003e \u003cp\u003e17.4 Resolution Limits Issues of Resists.\u003c\/p\u003e \u003cp\u003e17.5 Resist Materials Outlook for the 22-nm and Smaller Technology Nodes.\u003c\/p\u003e \u003cp\u003e17.6 Resist Processing Outlook for the 22-nm and Smaller Technology Nodes.\u003c\/p\u003e \u003cp\u003e\u003cb\u003eAfterword.\u003c\/b\u003e\u003c\/p\u003e \u003cp\u003e\u003cb\u003eIndex.\u003c\/b\u003e\u003c\/p\u003e","brand":"John Wiley \u0026 Sons Inc","offers":[{"title":"Default Title","offer_id":49406823301463,"sku":"9781118030028","price":108.86,"currency_code":"GBP","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0817\/1739\/5799\/files\/9781118030028.jpg?v=1730497238","url":"https:\/\/bookcurl.com\/products\/chemistry-and-lithography-9781118030028","provider":"Book Curl","version":"1.0","type":"link"}